JPS52127761A - Gas plasma etching unit - Google Patents

Gas plasma etching unit

Info

Publication number
JPS52127761A
JPS52127761A JP4460676A JP4460676A JPS52127761A JP S52127761 A JPS52127761 A JP S52127761A JP 4460676 A JP4460676 A JP 4460676A JP 4460676 A JP4460676 A JP 4460676A JP S52127761 A JPS52127761 A JP S52127761A
Authority
JP
Japan
Prior art keywords
plasma etching
gas plasma
etching unit
substrates
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4460676A
Other languages
Japanese (ja)
Inventor
Katsuhiro Fujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4460676A priority Critical patent/JPS52127761A/en
Publication of JPS52127761A publication Critical patent/JPS52127761A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To perform the gas plasma etching of many substrates as on equal conditions as possible by holding substrates on the external surrounding surfaces of each side of the hollow polyhedral prism fitting the size of substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP4460676A 1976-04-19 1976-04-19 Gas plasma etching unit Pending JPS52127761A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4460676A JPS52127761A (en) 1976-04-19 1976-04-19 Gas plasma etching unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4460676A JPS52127761A (en) 1976-04-19 1976-04-19 Gas plasma etching unit

Publications (1)

Publication Number Publication Date
JPS52127761A true JPS52127761A (en) 1977-10-26

Family

ID=12696097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4460676A Pending JPS52127761A (en) 1976-04-19 1976-04-19 Gas plasma etching unit

Country Status (1)

Country Link
JP (1) JPS52127761A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5391580A (en) * 1977-01-24 1978-08-11 Oki Electric Ind Co Ltd Manufacturing equipment for semiconductor device
JPS60126833A (en) * 1983-11-24 1985-07-06 Mitsubishi Electric Corp Plasma etching device
JPH01268127A (en) * 1988-04-20 1989-10-25 Nec Kyushu Ltd Dry etching device
JPH04290427A (en) * 1991-03-19 1992-10-15 Nec Yamaguchi Ltd Hexode type reactive ion etching apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5391580A (en) * 1977-01-24 1978-08-11 Oki Electric Ind Co Ltd Manufacturing equipment for semiconductor device
JPS60126833A (en) * 1983-11-24 1985-07-06 Mitsubishi Electric Corp Plasma etching device
JPH01268127A (en) * 1988-04-20 1989-10-25 Nec Kyushu Ltd Dry etching device
JPH04290427A (en) * 1991-03-19 1992-10-15 Nec Yamaguchi Ltd Hexode type reactive ion etching apparatus

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