JPS52140384A - Flaw detector - Google Patents

Flaw detector

Info

Publication number
JPS52140384A
JPS52140384A JP5652076A JP5652076A JPS52140384A JP S52140384 A JPS52140384 A JP S52140384A JP 5652076 A JP5652076 A JP 5652076A JP 5652076 A JP5652076 A JP 5652076A JP S52140384 A JPS52140384 A JP S52140384A
Authority
JP
Japan
Prior art keywords
flaw detector
flaw
diffraction
scattering
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5652076A
Other languages
Japanese (ja)
Other versions
JPS6026174B2 (en
Inventor
Tadashi Suda
Shinobu Hase
Katsumi Takami
Seiji Yonezawa
Hideki Shiono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5652076A priority Critical patent/JPS6026174B2/en
Publication of JPS52140384A publication Critical patent/JPS52140384A/en
Publication of JPS6026174B2 publication Critical patent/JPS6026174B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To automatically detect the flaw in the face of glass plate, by receiving and indicating the secondary light caused by disturbance resulted from reflection, diffraction, scattering, absorption, etc., when the ray goes through the defective place.
JP5652076A 1976-05-19 1976-05-19 Defect detection device Expired JPS6026174B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5652076A JPS6026174B2 (en) 1976-05-19 1976-05-19 Defect detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5652076A JPS6026174B2 (en) 1976-05-19 1976-05-19 Defect detection device

Publications (2)

Publication Number Publication Date
JPS52140384A true JPS52140384A (en) 1977-11-22
JPS6026174B2 JPS6026174B2 (en) 1985-06-22

Family

ID=13029382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5652076A Expired JPS6026174B2 (en) 1976-05-19 1976-05-19 Defect detection device

Country Status (1)

Country Link
JP (1) JPS6026174B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55104743A (en) * 1979-02-06 1980-08-11 Fujitsu Ltd Method for inspecting substrate
JPS56117153A (en) * 1980-02-21 1981-09-14 Telmec Co Ltd Detecting apparatus for dust of negative plate of photograph
JPS57127791A (en) * 1980-12-17 1982-08-09 Studiengesellschaft Kohle Mbh Method of apparatus for transferring optimum heat
JPS57131039A (en) * 1981-02-07 1982-08-13 Olympus Optical Co Ltd Defect detector
JPS585636A (en) * 1981-06-30 1983-01-13 Fujitsu Ltd Inspecting method for object to be inspected
JPS61117433A (en) * 1984-11-14 1986-06-04 Hitachi Ltd Semiconductor wafer foreign object detection method and device
JPS6367549A (en) * 1986-09-10 1988-03-26 Pioneer Electronic Corp Defect inspecting and film thickness measuring instrument for resist original disk
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55104743A (en) * 1979-02-06 1980-08-11 Fujitsu Ltd Method for inspecting substrate
JPS56117153A (en) * 1980-02-21 1981-09-14 Telmec Co Ltd Detecting apparatus for dust of negative plate of photograph
JPS57127791A (en) * 1980-12-17 1982-08-09 Studiengesellschaft Kohle Mbh Method of apparatus for transferring optimum heat
JPS57131039A (en) * 1981-02-07 1982-08-13 Olympus Optical Co Ltd Defect detector
JPS585636A (en) * 1981-06-30 1983-01-13 Fujitsu Ltd Inspecting method for object to be inspected
JPS61117433A (en) * 1984-11-14 1986-06-04 Hitachi Ltd Semiconductor wafer foreign object detection method and device
JPS6367549A (en) * 1986-09-10 1988-03-26 Pioneer Electronic Corp Defect inspecting and film thickness measuring instrument for resist original disk
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device

Also Published As

Publication number Publication date
JPS6026174B2 (en) 1985-06-22

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