JPS52152172A - Working method of mask alignment mark holes - Google Patents

Working method of mask alignment mark holes

Info

Publication number
JPS52152172A
JPS52152172A JP6944076A JP6944076A JPS52152172A JP S52152172 A JPS52152172 A JP S52152172A JP 6944076 A JP6944076 A JP 6944076A JP 6944076 A JP6944076 A JP 6944076A JP S52152172 A JPS52152172 A JP S52152172A
Authority
JP
Japan
Prior art keywords
alignment mark
working method
mask alignment
mark holes
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6944076A
Other languages
Japanese (ja)
Inventor
Yoshiaki Mimura
Satoru Nakayama
Toshiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6944076A priority Critical patent/JPS52152172A/en
Publication of JPS52152172A publication Critical patent/JPS52152172A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To work openings of a minute and accurate square or rectangular shape with good position accuracy on (100) wafer plane by using selective photoetching techniques.
COPYRIGHT: (C)1977,JPO&Japio
JP6944076A 1976-06-14 1976-06-14 Working method of mask alignment mark holes Pending JPS52152172A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6944076A JPS52152172A (en) 1976-06-14 1976-06-14 Working method of mask alignment mark holes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6944076A JPS52152172A (en) 1976-06-14 1976-06-14 Working method of mask alignment mark holes

Publications (1)

Publication Number Publication Date
JPS52152172A true JPS52152172A (en) 1977-12-17

Family

ID=13402686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6944076A Pending JPS52152172A (en) 1976-06-14 1976-06-14 Working method of mask alignment mark holes

Country Status (1)

Country Link
JP (1) JPS52152172A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895042U (en) * 1981-12-21 1983-06-28 日産自動車株式会社 Semiconductor element with V-shaped groove
JPS60175421A (en) * 1983-11-09 1985-09-09 アメリカン　テレフォン　アンド　テレグラフ　カムパニー Method of producing semiconductor device
JPS616829A (en) * 1984-06-20 1986-01-13 Nec Corp Formation of semiconductor substrate aligning pattern
JPS62114222A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Exposing apparatus
JPS6324617A (en) * 1986-07-17 1988-02-02 Yokogawa Electric Corp Method for double sided exposure of wafer
JPS6351631A (en) * 1986-08-20 1988-03-04 Sanyo Electric Co Ltd Manufacture of semiconductor device
JPH01214040A (en) * 1988-02-22 1989-08-28 Nec Corp Manufacture of semiconductor integrated circuit
KR100692837B1 (en) 2004-12-09 2007-03-09 엘지전자 주식회사 Aligning device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49114870A (en) * 1973-02-28 1974-11-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49114870A (en) * 1973-02-28 1974-11-01

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895042U (en) * 1981-12-21 1983-06-28 日産自動車株式会社 Semiconductor element with V-shaped groove
JPS60175421A (en) * 1983-11-09 1985-09-09 アメリカン　テレフォン　アンド　テレグラフ　カムパニー Method of producing semiconductor device
JPS616829A (en) * 1984-06-20 1986-01-13 Nec Corp Formation of semiconductor substrate aligning pattern
JPS62114222A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Exposing apparatus
JPS6324617A (en) * 1986-07-17 1988-02-02 Yokogawa Electric Corp Method for double sided exposure of wafer
JPS6351631A (en) * 1986-08-20 1988-03-04 Sanyo Electric Co Ltd Manufacture of semiconductor device
JPH01214040A (en) * 1988-02-22 1989-08-28 Nec Corp Manufacture of semiconductor integrated circuit
KR100692837B1 (en) 2004-12-09 2007-03-09 엘지전자 주식회사 Aligning device

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