JPS52155144A - Improved apparatus for low temperature plasma etching - Google Patents

Improved apparatus for low temperature plasma etching

Info

Publication number
JPS52155144A
JPS52155144A JP7229476A JP7229476A JPS52155144A JP S52155144 A JPS52155144 A JP S52155144A JP 7229476 A JP7229476 A JP 7229476A JP 7229476 A JP7229476 A JP 7229476A JP S52155144 A JPS52155144 A JP S52155144A
Authority
JP
Japan
Prior art keywords
low temperature
plasma etching
temperature plasma
improved apparatus
improved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7229476A
Other languages
Japanese (ja)
Inventor
Hisashi Nakane
Akira Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO OUKA KOUGIYOU KK
Original Assignee
TOKYO OUKA KOUGIYOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO OUKA KOUGIYOU KK filed Critical TOKYO OUKA KOUGIYOU KK
Priority to JP7229476A priority Critical patent/JPS52155144A/en
Publication of JPS52155144A publication Critical patent/JPS52155144A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP7229476A 1976-06-21 1976-06-21 Improved apparatus for low temperature plasma etching Pending JPS52155144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7229476A JPS52155144A (en) 1976-06-21 1976-06-21 Improved apparatus for low temperature plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7229476A JPS52155144A (en) 1976-06-21 1976-06-21 Improved apparatus for low temperature plasma etching

Publications (1)

Publication Number Publication Date
JPS52155144A true JPS52155144A (en) 1977-12-23

Family

ID=13485093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7229476A Pending JPS52155144A (en) 1976-06-21 1976-06-21 Improved apparatus for low temperature plasma etching

Country Status (1)

Country Link
JP (1) JPS52155144A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6048237U (en) * 1983-09-09 1985-04-04 ウシオ電機株式会社 UV cleaning equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6048237U (en) * 1983-09-09 1985-04-04 ウシオ電機株式会社 UV cleaning equipment

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