JPS524177A - Automatic mask aligning method - Google Patents
Automatic mask aligning methodInfo
- Publication number
- JPS524177A JPS524177A JP50080190A JP8019075A JPS524177A JP S524177 A JPS524177 A JP S524177A JP 50080190 A JP50080190 A JP 50080190A JP 8019075 A JP8019075 A JP 8019075A JP S524177 A JPS524177 A JP S524177A
- Authority
- JP
- Japan
- Prior art keywords
- aligning method
- automatic mask
- mask aligning
- automatic
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To automatically with a high precision align mask/by forming a key pattern in a chip pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50080190A JPS524177A (en) | 1975-06-27 | 1975-06-27 | Automatic mask aligning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50080190A JPS524177A (en) | 1975-06-27 | 1975-06-27 | Automatic mask aligning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS524177A true JPS524177A (en) | 1977-01-13 |
Family
ID=13711446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50080190A Pending JPS524177A (en) | 1975-06-27 | 1975-06-27 | Automatic mask aligning method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS524177A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5389172U (en) * | 1976-12-21 | 1978-07-21 | ||
| JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
| JPS54118070U (en) * | 1978-02-07 | 1979-08-18 | ||
| JPS54136173A (en) * | 1978-04-13 | 1979-10-23 | Omron Tateisi Electronics Co | Semiconductor device |
| JPS5655041A (en) * | 1979-10-11 | 1981-05-15 | Nippon Telegr & Teleph Corp <Ntt> | Positioning exposure |
-
1975
- 1975-06-27 JP JP50080190A patent/JPS524177A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5389172U (en) * | 1976-12-21 | 1978-07-21 | ||
| JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
| JPS54118070U (en) * | 1978-02-07 | 1979-08-18 | ||
| JPS54136173A (en) * | 1978-04-13 | 1979-10-23 | Omron Tateisi Electronics Co | Semiconductor device |
| JPS5655041A (en) * | 1979-10-11 | 1981-05-15 | Nippon Telegr & Teleph Corp <Ntt> | Positioning exposure |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS51120180A (en) | Pattern printing device | |
| JPS524177A (en) | Automatic mask aligning method | |
| JPS5223251A (en) | Semiconductor circuit | |
| JPS5255303A (en) | Voice discriminator | |
| JPS5320051A (en) | Cam device | |
| JPS52143772A (en) | Alignment method of masks using special reference marks | |
| JPS53141035A (en) | Photoetching method | |
| JPS51120615A (en) | Manufacturing method for comb-type electrodes | |
| JPS51120727A (en) | Photograph processing method | |
| JPS5277569A (en) | Logical circuit | |
| JPS5237282A (en) | Method and apparatus for machining cam surfaces | |
| JPS525270A (en) | Photo-mask | |
| JPS5216956A (en) | Self-bias type amplifier | |
| JPS5213734A (en) | Pattern recognition device | |
| JPS5258462A (en) | Marking device | |
| JPS52109604A (en) | Centering method | |
| JPS5299773A (en) | Forming method for small size regions | |
| JPS5250711A (en) | Process for production of slider | |
| JPS5234758A (en) | Process for the fabrication of a character plate | |
| JPS52107699A (en) | Fabricating method using laser | |
| JPS5418677A (en) | Positioning mark for photo etching | |
| JPS5396678A (en) | Method and apparatus for mask pattern exposure | |
| JPS51119677A (en) | A method for treating a slag after desulfurization | |
| JPS53146573A (en) | Checking method for mask defect | |
| JPS5259574A (en) | Production of lead frame for ic |