JPS5243361A - Thermal diffusion device for production of semiconductor device - Google Patents

Thermal diffusion device for production of semiconductor device

Info

Publication number
JPS5243361A
JPS5243361A JP11913575A JP11913575A JPS5243361A JP S5243361 A JPS5243361 A JP S5243361A JP 11913575 A JP11913575 A JP 11913575A JP 11913575 A JP11913575 A JP 11913575A JP S5243361 A JPS5243361 A JP S5243361A
Authority
JP
Japan
Prior art keywords
production
thermal diffusion
semiconductor device
wafers
diffusion device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11913575A
Other languages
Japanese (ja)
Inventor
Masao Yamawaki
Katsuo Aoki
Yoshio Oka
Takao Suzuki
Osamu Ina
Kunihiko Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP11913575A priority Critical patent/JPS5243361A/en
Priority to US05/714,806 priority patent/US4075972A/en
Publication of JPS5243361A publication Critical patent/JPS5243361A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To subsequently feed wafers placed in heat-resistant boats into a diffusion furnace of a predetermined temperature and of a uniform gas atmosphere and take them out from the other end, thereby giving uniform heat history to all wafers.
COPYRIGHT: (C)1977,JPO&Japio
JP11913575A 1975-08-20 1975-10-01 Thermal diffusion device for production of semiconductor device Pending JPS5243361A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP11913575A JPS5243361A (en) 1975-10-01 1975-10-01 Thermal diffusion device for production of semiconductor device
US05/714,806 US4075972A (en) 1975-08-20 1976-08-16 Apparatus for thermal diffusion of semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11913575A JPS5243361A (en) 1975-10-01 1975-10-01 Thermal diffusion device for production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5243361A true JPS5243361A (en) 1977-04-05

Family

ID=14753791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11913575A Pending JPS5243361A (en) 1975-08-20 1975-10-01 Thermal diffusion device for production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5243361A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146228A (en) * 1980-04-16 1981-11-13 Matsushita Electric Ind Co Ltd Method and device for heat-treatment of semiconductor substrate
JPS61116832A (en) * 1984-11-13 1986-06-04 Nec Corp Heat processing method for semiconductor substrate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4829810U (en) * 1971-08-14 1973-04-12
JPS4916221A (en) * 1972-06-07 1974-02-13

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4829810U (en) * 1971-08-14 1973-04-12
JPS4916221A (en) * 1972-06-07 1974-02-13

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146228A (en) * 1980-04-16 1981-11-13 Matsushita Electric Ind Co Ltd Method and device for heat-treatment of semiconductor substrate
JPS61116832A (en) * 1984-11-13 1986-06-04 Nec Corp Heat processing method for semiconductor substrate

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