JPS5262045A - Measuring thickness of non-electrolytic copper plating of through-hole substrate - Google Patents
Measuring thickness of non-electrolytic copper plating of through-hole substrateInfo
- Publication number
- JPS5262045A JPS5262045A JP13722175A JP13722175A JPS5262045A JP S5262045 A JPS5262045 A JP S5262045A JP 13722175 A JP13722175 A JP 13722175A JP 13722175 A JP13722175 A JP 13722175A JP S5262045 A JPS5262045 A JP S5262045A
- Authority
- JP
- Japan
- Prior art keywords
- copper plating
- electrolytic copper
- measuring thickness
- hole substrate
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title abstract 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052802 copper Inorganic materials 0.000 title abstract 2
- 239000010949 copper Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 238000005259 measurement Methods 0.000 abstract 1
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Abstract
PURPOSE: To enable quick and exact measurement of the thickness of plating by applying a current to the through-hole copper plating layer of the substrate a current changing in value linearly, and detecting the amount of the current at the time when the plating layer is melted by Joule heat.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13722175A JPS5262045A (en) | 1975-11-17 | 1975-11-17 | Measuring thickness of non-electrolytic copper plating of through-hole substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13722175A JPS5262045A (en) | 1975-11-17 | 1975-11-17 | Measuring thickness of non-electrolytic copper plating of through-hole substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5262045A true JPS5262045A (en) | 1977-05-23 |
| JPS5728082B2 JPS5728082B2 (en) | 1982-06-15 |
Family
ID=15193604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13722175A Granted JPS5262045A (en) | 1975-11-17 | 1975-11-17 | Measuring thickness of non-electrolytic copper plating of through-hole substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5262045A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929567A1 (en) * | 1978-07-19 | 1980-01-31 | Kollmorgen Tech Corp | METHOD AND DEVICE FOR THE AUTOMATIC DETERMINATION OF THICKNESS |
| CN110307776A (en) * | 2019-08-06 | 2019-10-08 | 无锡市帕尔斯仪器有限公司 | A kind of thickness measuring method of hole face copper integration measuring thickness device and five terminal micrometer resistance |
-
1975
- 1975-11-17 JP JP13722175A patent/JPS5262045A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929567A1 (en) * | 1978-07-19 | 1980-01-31 | Kollmorgen Tech Corp | METHOD AND DEVICE FOR THE AUTOMATIC DETERMINATION OF THICKNESS |
| CN110307776A (en) * | 2019-08-06 | 2019-10-08 | 无锡市帕尔斯仪器有限公司 | A kind of thickness measuring method of hole face copper integration measuring thickness device and five terminal micrometer resistance |
| CN110307776B (en) * | 2019-08-06 | 2024-03-26 | 无锡市帕尔斯仪器有限公司 | Hole surface copper integrated thickness measuring device and thickness measuring method of five-terminal micro-resistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5728082B2 (en) | 1982-06-15 |
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