JPS5265183A - Production process of thin film of compounds - Google Patents

Production process of thin film of compounds

Info

Publication number
JPS5265183A
JPS5265183A JP50142096A JP14209675A JPS5265183A JP S5265183 A JPS5265183 A JP S5265183A JP 50142096 A JP50142096 A JP 50142096A JP 14209675 A JP14209675 A JP 14209675A JP S5265183 A JPS5265183 A JP S5265183A
Authority
JP
Japan
Prior art keywords
compounds
thin film
production process
substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50142096A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50142096A priority Critical patent/JPS5265183A/en
Publication of JPS5265183A publication Critical patent/JPS5265183A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form the uniform thin film of compounds having excellent capacity by sticking the film at the place at which the back of the plastic film (sheet) substrate does not contact the holding mechanism of the substrate, such as roller, etc.
JP50142096A 1975-11-26 1975-11-26 Production process of thin film of compounds Pending JPS5265183A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50142096A JPS5265183A (en) 1975-11-26 1975-11-26 Production process of thin film of compounds

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50142096A JPS5265183A (en) 1975-11-26 1975-11-26 Production process of thin film of compounds

Publications (1)

Publication Number Publication Date
JPS5265183A true JPS5265183A (en) 1977-05-30

Family

ID=15307325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50142096A Pending JPS5265183A (en) 1975-11-26 1975-11-26 Production process of thin film of compounds

Country Status (1)

Country Link
JP (1) JPS5265183A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films
US5107791A (en) * 1987-12-17 1992-04-28 Toyo Ink Manufacturing Co., Ltd. Process for the manufacture of deposition films and apparatus therefor
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
JP2017502172A (en) * 2013-12-10 2017-01-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus having substrate spreading device, and method of operating the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4973085A (en) * 1972-11-14 1974-07-15
JPS5093275A (en) * 1973-12-24 1975-07-25
JPS50128639A (en) * 1974-03-29 1975-10-09
JPS50133176A (en) * 1974-04-09 1975-10-22

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4973085A (en) * 1972-11-14 1974-07-15
JPS5093275A (en) * 1973-12-24 1975-07-25
JPS50128639A (en) * 1974-03-29 1975-10-09
JPS50133176A (en) * 1974-04-09 1975-10-22

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films
US5107791A (en) * 1987-12-17 1992-04-28 Toyo Ink Manufacturing Co., Ltd. Process for the manufacture of deposition films and apparatus therefor
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
JP2017502172A (en) * 2013-12-10 2017-01-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus having substrate spreading device, and method of operating the same

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