JPS53100767A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS53100767A
JPS53100767A JP1456277A JP1456277A JPS53100767A JP S53100767 A JPS53100767 A JP S53100767A JP 1456277 A JP1456277 A JP 1456277A JP 1456277 A JP1456277 A JP 1456277A JP S53100767 A JPS53100767 A JP S53100767A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
diffusion
wafers
putting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1456277A
Other languages
Japanese (ja)
Other versions
JPS5839375B2 (en
Inventor
Yoshito Ichinose
Yoshiyuki Shibamata
Yoshinobu Monma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1456277A priority Critical patent/JPS5839375B2/en
Publication of JPS53100767A publication Critical patent/JPS53100767A/en
Publication of JPS5839375B2 publication Critical patent/JPS5839375B2/en
Expired legal-status Critical Current

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Abstract

PURPOSE: To make uniform products through quick diffusion by putting the wafers to be subjected to emitter diffusion under a temperature distribution in which the temperature changes nearly uniformly along their arraying direction in performing diffusion.
COPYRIGHT: (C)1978,JPO&Japio
JP1456277A 1977-02-15 1977-02-15 Manufacturing method of semiconductor device Expired JPS5839375B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1456277A JPS5839375B2 (en) 1977-02-15 1977-02-15 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1456277A JPS5839375B2 (en) 1977-02-15 1977-02-15 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS53100767A true JPS53100767A (en) 1978-09-02
JPS5839375B2 JPS5839375B2 (en) 1983-08-30

Family

ID=11864585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1456277A Expired JPS5839375B2 (en) 1977-02-15 1977-02-15 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5839375B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5824788A (en) * 1981-08-07 1983-02-14 真空理工株式会社 Temperature dradient furnace
JPH02132822A (en) * 1988-11-14 1990-05-22 Mitsumi Electric Co Ltd Manufacture of semiconductor device
JPH0547685A (en) * 1991-08-07 1993-02-26 Rohm Co Ltd Method for diffusing impurities into semiconductor wafer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146770A (en) * 1984-08-14 1986-03-07 Fuji Heavy Ind Ltd Side rail round structure in automobile

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5824788A (en) * 1981-08-07 1983-02-14 真空理工株式会社 Temperature dradient furnace
JPH02132822A (en) * 1988-11-14 1990-05-22 Mitsumi Electric Co Ltd Manufacture of semiconductor device
JPH0547685A (en) * 1991-08-07 1993-02-26 Rohm Co Ltd Method for diffusing impurities into semiconductor wafer

Also Published As

Publication number Publication date
JPS5839375B2 (en) 1983-08-30

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