JPS5314572A - Etching method and mixed gas for etching - Google Patents

Etching method and mixed gas for etching

Info

Publication number
JPS5314572A
JPS5314572A JP8939976A JP8939976A JPS5314572A JP S5314572 A JPS5314572 A JP S5314572A JP 8939976 A JP8939976 A JP 8939976A JP 8939976 A JP8939976 A JP 8939976A JP S5314572 A JPS5314572 A JP S5314572A
Authority
JP
Japan
Prior art keywords
etching
mixed gas
etching method
gas
clo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8939976A
Other languages
Japanese (ja)
Other versions
JPS6019140B2 (en
Inventor
Kazushi Nagata
Shigeji Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8939976A priority Critical patent/JPS6019140B2/en
Publication of JPS5314572A publication Critical patent/JPS5314572A/en
Publication of JPS6019140B2 publication Critical patent/JPS6019140B2/en
Expired legal-status Critical Current

Links

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To increase plasma etching rate and prevent the degradation of resist materials by using the gas comprising mixing of 1 to 60 mole % of ClO2 to any of CF4, CCl2, F2, SF6 or halogen alone.
COPYRIGHT: (C)1978,JPO&Japio
JP8939976A 1976-07-26 1976-07-26 Etching method and mixture gas for plasma etching Expired JPS6019140B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8939976A JPS6019140B2 (en) 1976-07-26 1976-07-26 Etching method and mixture gas for plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8939976A JPS6019140B2 (en) 1976-07-26 1976-07-26 Etching method and mixture gas for plasma etching

Publications (2)

Publication Number Publication Date
JPS5314572A true JPS5314572A (en) 1978-02-09
JPS6019140B2 JPS6019140B2 (en) 1985-05-14

Family

ID=13969557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8939976A Expired JPS6019140B2 (en) 1976-07-26 1976-07-26 Etching method and mixture gas for plasma etching

Country Status (1)

Country Link
JP (1) JPS6019140B2 (en)

Also Published As

Publication number Publication date
JPS6019140B2 (en) 1985-05-14

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