JPS5397775A - Etching method - Google Patents

Etching method

Info

Publication number
JPS5397775A
JPS5397775A JP1264077A JP1264077A JPS5397775A JP S5397775 A JPS5397775 A JP S5397775A JP 1264077 A JP1264077 A JP 1264077A JP 1264077 A JP1264077 A JP 1264077A JP S5397775 A JPS5397775 A JP S5397775A
Authority
JP
Japan
Prior art keywords
etching method
etching
plave
formtion
sio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1264077A
Other languages
Japanese (ja)
Inventor
Keiji Nishimoto
Yukihiro Ooyama
Kazunari Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1264077A priority Critical patent/JPS5397775A/en
Publication of JPS5397775A publication Critical patent/JPS5397775A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To eliminate remaining of SiO2 film in undesired portions by repeating resist mask formtion and etching in the same plave.
COPYRIGHT: (C)1978,JPO&Japio
JP1264077A 1977-02-08 1977-02-08 Etching method Pending JPS5397775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1264077A JPS5397775A (en) 1977-02-08 1977-02-08 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1264077A JPS5397775A (en) 1977-02-08 1977-02-08 Etching method

Publications (1)

Publication Number Publication Date
JPS5397775A true JPS5397775A (en) 1978-08-26

Family

ID=11810957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1264077A Pending JPS5397775A (en) 1977-02-08 1977-02-08 Etching method

Country Status (1)

Country Link
JP (1) JPS5397775A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6194312B1 (en) 1997-07-10 2001-02-27 Nec Corporation Semiconductor device and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6194312B1 (en) 1997-07-10 2001-02-27 Nec Corporation Semiconductor device and method of manufacturing the same

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