JPS5325366A - Plasma treating method and apparat us - Google Patents

Plasma treating method and apparat us

Info

Publication number
JPS5325366A
JPS5325366A JP9968476A JP9968476A JPS5325366A JP S5325366 A JPS5325366 A JP S5325366A JP 9968476 A JP9968476 A JP 9968476A JP 9968476 A JP9968476 A JP 9968476A JP S5325366 A JPS5325366 A JP S5325366A
Authority
JP
Japan
Prior art keywords
apparat
plasma
treating method
plasma treating
flows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9968476A
Other languages
Japanese (ja)
Inventor
Takashi Tsuchimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9968476A priority Critical patent/JPS5325366A/en
Publication of JPS5325366A publication Critical patent/JPS5325366A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To make possible easy generation of various plasma flows and expand the application range of deposition and etching by plasma flows using a plasma transport method by removing the restrictions on the plasma forming materials to be used.
COPYRIGHT: (C)1978,JPO&Japio
JP9968476A 1976-08-23 1976-08-23 Plasma treating method and apparat us Pending JPS5325366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9968476A JPS5325366A (en) 1976-08-23 1976-08-23 Plasma treating method and apparat us

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9968476A JPS5325366A (en) 1976-08-23 1976-08-23 Plasma treating method and apparat us

Publications (1)

Publication Number Publication Date
JPS5325366A true JPS5325366A (en) 1978-03-09

Family

ID=14253854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9968476A Pending JPS5325366A (en) 1976-08-23 1976-08-23 Plasma treating method and apparat us

Country Status (1)

Country Link
JP (1) JPS5325366A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665142A (en) * 1979-11-01 1981-06-02 Fuji Photo Film Co Ltd Manufacture of electrophotographic receptor
JPH0434704U (en) * 1990-07-16 1992-03-23
JP2008053549A (en) * 2006-08-25 2008-03-06 Matsushita Electric Ind Co Ltd Circuit body mounting method and apparatus on display panel

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665142A (en) * 1979-11-01 1981-06-02 Fuji Photo Film Co Ltd Manufacture of electrophotographic receptor
JPH0434704U (en) * 1990-07-16 1992-03-23
JP2008053549A (en) * 2006-08-25 2008-03-06 Matsushita Electric Ind Co Ltd Circuit body mounting method and apparatus on display panel

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