JPS5287985A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS5287985A
JPS5287985A JP473876A JP473876A JPS5287985A JP S5287985 A JPS5287985 A JP S5287985A JP 473876 A JP473876 A JP 473876A JP 473876 A JP473876 A JP 473876A JP S5287985 A JPS5287985 A JP S5287985A
Authority
JP
Japan
Prior art keywords
plasma etching
etching method
etching
palsmas
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP473876A
Other languages
Japanese (ja)
Other versions
JPS5645291B2 (en
Inventor
Haruhiko Abe
Kyusaku Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP473876A priority Critical patent/JPS5287985A/en
Publication of JPS5287985A publication Critical patent/JPS5287985A/en
Publication of JPS5645291B2 publication Critical patent/JPS5645291B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To perform perfect etching with good dimensional accuracy and without residual film by performing etching with gas palsmas containing activated halogen.
COPYRIGHT: (C)1977,JPO&Japio
JP473876A 1976-01-19 1976-01-19 Plasma etching method Granted JPS5287985A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP473876A JPS5287985A (en) 1976-01-19 1976-01-19 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP473876A JPS5287985A (en) 1976-01-19 1976-01-19 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS5287985A true JPS5287985A (en) 1977-07-22
JPS5645291B2 JPS5645291B2 (en) 1981-10-26

Family

ID=11592241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP473876A Granted JPS5287985A (en) 1976-01-19 1976-01-19 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5287985A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158343A (en) * 1978-06-05 1979-12-14 Hitachi Ltd Dry etching method for al and al alloy
JPS5518399A (en) * 1978-07-27 1980-02-08 Eaton Corp Plasma etching method of aluminium article
JPS55132038A (en) * 1979-04-02 1980-10-14 Matsushita Electronics Corp Forming method for metallic electrode on semiconductor substrate
JPS55166925A (en) * 1979-06-13 1980-12-26 Matsushita Electronics Corp Application of metal film on semiconductor substrate
US6786997B1 (en) 1984-11-26 2004-09-07 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4975270A (en) * 1972-11-22 1974-07-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4975270A (en) * 1972-11-22 1974-07-19

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158343A (en) * 1978-06-05 1979-12-14 Hitachi Ltd Dry etching method for al and al alloy
JPS5518399A (en) * 1978-07-27 1980-02-08 Eaton Corp Plasma etching method of aluminium article
JPS55132038A (en) * 1979-04-02 1980-10-14 Matsushita Electronics Corp Forming method for metallic electrode on semiconductor substrate
JPS55166925A (en) * 1979-06-13 1980-12-26 Matsushita Electronics Corp Application of metal film on semiconductor substrate
US6786997B1 (en) 1984-11-26 2004-09-07 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus

Also Published As

Publication number Publication date
JPS5645291B2 (en) 1981-10-26

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