JPS5340285A - Detection method for position-matching error - Google Patents

Detection method for position-matching error

Info

Publication number
JPS5340285A
JPS5340285A JP11515676A JP11515676A JPS5340285A JP S5340285 A JPS5340285 A JP S5340285A JP 11515676 A JP11515676 A JP 11515676A JP 11515676 A JP11515676 A JP 11515676A JP S5340285 A JPS5340285 A JP S5340285A
Authority
JP
Japan
Prior art keywords
pattern
detection method
matching error
maching
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11515676A
Other languages
Japanese (ja)
Other versions
JPS562786B2 (en
Inventor
Shigeharu Abe
Takenori Okubo
Hideo Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11515676A priority Critical patent/JPS5340285A/en
Publication of JPS5340285A publication Critical patent/JPS5340285A/en
Publication of JPS562786B2 publication Critical patent/JPS562786B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To secure an overlap between the first position-maching pattern in which plural units of the same shape patterns are distributed in a cross-shaped direction with equal pitches and the second position-maching pattern which is analogous to the first pattern but different in the pitches. Thus, the discrepancy between the substrate and the mask can be detected easily based on the overlapping state between the both patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP11515676A 1976-09-25 1976-09-25 Detection method for position-matching error Granted JPS5340285A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11515676A JPS5340285A (en) 1976-09-25 1976-09-25 Detection method for position-matching error

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11515676A JPS5340285A (en) 1976-09-25 1976-09-25 Detection method for position-matching error

Publications (2)

Publication Number Publication Date
JPS5340285A true JPS5340285A (en) 1978-04-12
JPS562786B2 JPS562786B2 (en) 1981-01-21

Family

ID=14655701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11515676A Granted JPS5340285A (en) 1976-09-25 1976-09-25 Detection method for position-matching error

Country Status (1)

Country Link
JP (1) JPS5340285A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56167329A (en) * 1980-05-29 1981-12-23 Nec Corp Piling joint setting mark to be used in fine processing exposure technology
JPS57166034A (en) * 1981-04-07 1982-10-13 Matsushita Electric Ind Co Ltd Positioning method
JPS616824A (en) * 1984-06-20 1986-01-13 Nec Corp Alignment of semiconductor substrate
JPS63209125A (en) * 1987-02-25 1988-08-30 Canon Inc Mark forming method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5147028A (en) * 1974-10-21 1976-04-22 Fukuda Metal Foil Powder DODENSEITORYO

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5147028A (en) * 1974-10-21 1976-04-22 Fukuda Metal Foil Powder DODENSEITORYO

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56167329A (en) * 1980-05-29 1981-12-23 Nec Corp Piling joint setting mark to be used in fine processing exposure technology
JPS57166034A (en) * 1981-04-07 1982-10-13 Matsushita Electric Ind Co Ltd Positioning method
JPS616824A (en) * 1984-06-20 1986-01-13 Nec Corp Alignment of semiconductor substrate
JPS63209125A (en) * 1987-02-25 1988-08-30 Canon Inc Mark forming method

Also Published As

Publication number Publication date
JPS562786B2 (en) 1981-01-21

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