JPS5346285A - Mesa type high breakdown voltage semiconductor device - Google Patents
Mesa type high breakdown voltage semiconductor deviceInfo
- Publication number
- JPS5346285A JPS5346285A JP12108776A JP12108776A JPS5346285A JP S5346285 A JPS5346285 A JP S5346285A JP 12108776 A JP12108776 A JP 12108776A JP 12108776 A JP12108776 A JP 12108776A JP S5346285 A JPS5346285 A JP S5346285A
- Authority
- JP
- Japan
- Prior art keywords
- breakdown voltage
- high breakdown
- semiconductor device
- type high
- voltage semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/40—Vertical BJTs
- H10D10/441—Vertical BJTs having an emitter-base junction ending at a main surface of the body and a base-collector junction ending at a lateral surface of the body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/104—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices having particular shapes of the bodies at or near reverse-biased junctions, e.g. having bevels or moats
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/422—PN diodes having the PN junctions in mesas
Landscapes
- Bipolar Transistors (AREA)
- Thyristors (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To enable a high breakdown voltage to be obtained even at shallow mesa grooves by making small the impurity concentration gradient near PN junctions in a diode, transistor, thyristor, etc. having mesa type PN junctions and making shallow the mesa grooves.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12108776A JPS5346285A (en) | 1976-10-08 | 1976-10-08 | Mesa type high breakdown voltage semiconductor device |
| DE2745300A DE2745300C2 (en) | 1976-10-08 | 1977-10-07 | Mesa semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12108776A JPS5346285A (en) | 1976-10-08 | 1976-10-08 | Mesa type high breakdown voltage semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5346285A true JPS5346285A (en) | 1978-04-25 |
Family
ID=14802535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12108776A Pending JPS5346285A (en) | 1976-10-08 | 1976-10-08 | Mesa type high breakdown voltage semiconductor device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5346285A (en) |
| DE (1) | DE2745300C2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3151141A1 (en) * | 1981-12-23 | 1983-06-30 | Siemens AG, 1000 Berlin und 8000 München | SEMICONDUCTOR COMPONENT WITH HIGH IMPACT-RESISTANCE |
| EP0604163B1 (en) * | 1992-12-21 | 1999-03-24 | STMicroelectronics, Inc. | PN junction diode structure |
| JPH06342902A (en) * | 1993-06-01 | 1994-12-13 | Komatsu Ltd | High breakdown strength semiconductor device |
| US5880511A (en) * | 1995-06-30 | 1999-03-09 | Semtech Corporation | Low-voltage punch-through transient suppressor employing a dual-base structure |
| CN104900692A (en) * | 2015-06-15 | 2015-09-09 | 江苏东晨电子科技有限公司 | Mesa thyristor and preparation method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1439417B2 (en) * | 1964-07-21 | 1976-09-23 | Siemens AG, 1000 Berlin und 8000 München | METHOD OF MANUFACTURING A SEMICONDUCTOR ARRANGEMENT |
| CH426020A (en) * | 1965-09-08 | 1966-12-15 | Bbc Brown Boveri & Cie | Method for producing the semiconductor element of a surge voltage-resistant semiconductor valve, as well as a semiconductor element produced with the aid of this method |
| US3414780A (en) * | 1966-01-06 | 1968-12-03 | Int Rectifier Corp | High voltage semiconductor device with electrical gradient-reducing groove |
| US3628106A (en) * | 1969-05-05 | 1971-12-14 | Gen Electric | Passivated semiconductor device with protective peripheral junction portion |
-
1976
- 1976-10-08 JP JP12108776A patent/JPS5346285A/en active Pending
-
1977
- 1977-10-07 DE DE2745300A patent/DE2745300C2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2745300C2 (en) | 1984-05-17 |
| DE2745300A1 (en) | 1978-04-13 |
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