JPS5347281A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5347281A
JPS5347281A JP12268176A JP12268176A JPS5347281A JP S5347281 A JPS5347281 A JP S5347281A JP 12268176 A JP12268176 A JP 12268176A JP 12268176 A JP12268176 A JP 12268176A JP S5347281 A JPS5347281 A JP S5347281A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
solvent
etching
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12268176A
Other languages
Japanese (ja)
Other versions
JPS5852341B2 (en
Inventor
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP51122681A priority Critical patent/JPS5852341B2/en
Publication of JPS5347281A publication Critical patent/JPS5347281A/en
Publication of JPS5852341B2 publication Critical patent/JPS5852341B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To readily obtain an etching mask for conductive wiring patterns and increase yield by performing etching of a second mask material composed of photoresist in a solvent or solvent vapor atmosphere.
COPYRIGHT: (C)1978,JPO&Japio
JP51122681A 1976-10-12 1976-10-12 Manufacturing method of semiconductor device Expired JPS5852341B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51122681A JPS5852341B2 (en) 1976-10-12 1976-10-12 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51122681A JPS5852341B2 (en) 1976-10-12 1976-10-12 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5347281A true JPS5347281A (en) 1978-04-27
JPS5852341B2 JPS5852341B2 (en) 1983-11-22

Family

ID=14841982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51122681A Expired JPS5852341B2 (en) 1976-10-12 1976-10-12 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5852341B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57170553A (en) * 1981-04-15 1982-10-20 Fujitsu Ltd Manufacture of semiconductor device
JP2012164876A (en) * 2011-02-08 2012-08-30 Mitsubishi Chemicals Corp Method of forming interconnection or electrode, electronic device, and method of manufacturing the same
JP2022090792A (en) * 2020-12-08 2022-06-20 太陽誘電株式会社 Manufacturing method of acoustic wave device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57170553A (en) * 1981-04-15 1982-10-20 Fujitsu Ltd Manufacture of semiconductor device
JP2012164876A (en) * 2011-02-08 2012-08-30 Mitsubishi Chemicals Corp Method of forming interconnection or electrode, electronic device, and method of manufacturing the same
JP2022090792A (en) * 2020-12-08 2022-06-20 太陽誘電株式会社 Manufacturing method of acoustic wave device

Also Published As

Publication number Publication date
JPS5852341B2 (en) 1983-11-22

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