JPS5349959A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5349959A
JPS5349959A JP12471576A JP12471576A JPS5349959A JP S5349959 A JPS5349959 A JP S5349959A JP 12471576 A JP12471576 A JP 12471576A JP 12471576 A JP12471576 A JP 12471576A JP S5349959 A JPS5349959 A JP S5349959A
Authority
JP
Japan
Prior art keywords
conductor
diffusion
window
manufacture
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12471576A
Other languages
Japanese (ja)
Inventor
Satoru Fukano
Hikosuke Shibayama
Hajime Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12471576A priority Critical patent/JPS5349959A/en
Publication of JPS5349959A publication Critical patent/JPS5349959A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE: A diffusion mask containing two diffusion windows is formed on a single conductor-type semiconductor substrate, and the glass layer containing the adverse conductor-type impurity is provided on the first window and the glass layer containing the single conductor-type impurity along with Si3N4 film are provided on the second window. Then a heat treatment is conducted under N2 atmosphere containing O2: Thus, the different conductor-type regions can be formed through diffusion at one time.
COPYRIGHT: (C)1978,JPO&Japio
JP12471576A 1976-10-18 1976-10-18 Manufacture of semiconductor device Pending JPS5349959A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12471576A JPS5349959A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12471576A JPS5349959A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5349959A true JPS5349959A (en) 1978-05-06

Family

ID=14892304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12471576A Pending JPS5349959A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5349959A (en)

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