JPS5355984A - Ion beam irradiating method and its device - Google Patents
Ion beam irradiating method and its deviceInfo
- Publication number
- JPS5355984A JPS5355984A JP13092876A JP13092876A JPS5355984A JP S5355984 A JPS5355984 A JP S5355984A JP 13092876 A JP13092876 A JP 13092876A JP 13092876 A JP13092876 A JP 13092876A JP S5355984 A JPS5355984 A JP S5355984A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- beam irradiating
- irradiating method
- ion
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51130928A JPS5945217B2 (ja) | 1976-10-29 | 1976-10-29 | イオンビ−ム照射方法及びこれに使用する装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51130928A JPS5945217B2 (ja) | 1976-10-29 | 1976-10-29 | イオンビ−ム照射方法及びこれに使用する装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5355984A true JPS5355984A (en) | 1978-05-20 |
| JPS5945217B2 JPS5945217B2 (ja) | 1984-11-05 |
Family
ID=15045991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51130928A Expired JPS5945217B2 (ja) | 1976-10-29 | 1976-10-29 | イオンビ−ム照射方法及びこれに使用する装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5945217B2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981003239A1 (fr) * | 1980-05-02 | 1981-11-12 | Hitachi Ltd | Appareil d'implantation d'ions pour la fabrication de semi-conducteurs |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03116726U (ja) * | 1990-03-15 | 1991-12-03 |
-
1976
- 1976-10-29 JP JP51130928A patent/JPS5945217B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981003239A1 (fr) * | 1980-05-02 | 1981-11-12 | Hitachi Ltd | Appareil d'implantation d'ions pour la fabrication de semi-conducteurs |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5945217B2 (ja) | 1984-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5232744A (en) | Method of making sanitary interior layer for shoes | |
| JPS52119185A (en) | Electron beam exposure equipment | |
| JPS5239893A (en) | Device for irradiating a laser beam | |
| JPS5427369A (en) | Pattern formation method | |
| JPS5222586A (en) | Method for protective treatment of fluorescent substance | |
| JPS51148365A (en) | Electron beam exposure method | |
| JPS5362477A (en) | Electron beam drawing device | |
| JPS52121979A (en) | Ultraviolet ray irradiation apparatus which can adjust angle of irradi ation | |
| JPS52130052A (en) | Irradiation width-variable irradiating device | |
| JPS5215267A (en) | Fine processing method | |
| JPS51117569A (en) | Sample drift correction device | |
| JPS5214374A (en) | Treatment equpment for ion beam | |
| JPS51136286A (en) | Ion implantation using noncrystalline carchogenide thin film as mask | |
| JPS5227995A (en) | Rotating device for electron beam irradiation | |
| JPS52127764A (en) | Etching method | |
| JPS5340195A (en) | Irradiating method of radioactive ray | |
| JPS53125695A (en) | Exposing method for electron rays | |
| JPS51119187A (en) | Irradiation device | |
| JPS52114196A (en) | Ion beam finishing device | |
| JPS5410459A (en) | Microwave irradiating device | |
| JPS5350978A (en) | Electron beam exposure method | |
| JPS53114744A (en) | Etching method | |
| JPS52113682A (en) | Trapezoid drawing apparatus | |
| JPS52145698A (en) | Irradiation equipment | |
| JPS535397A (en) | Irradiating device |