JPS51148365A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS51148365A
JPS51148365A JP50072575A JP7257575A JPS51148365A JP S51148365 A JPS51148365 A JP S51148365A JP 50072575 A JP50072575 A JP 50072575A JP 7257575 A JP7257575 A JP 7257575A JP S51148365 A JPS51148365 A JP S51148365A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure method
rise
accuracy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50072575A
Other languages
Japanese (ja)
Other versions
JPS5414470B2 (en
Inventor
Masahiro Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50072575A priority Critical patent/JPS51148365A/en
Publication of JPS51148365A publication Critical patent/JPS51148365A/en
Publication of JPS5414470B2 publication Critical patent/JPS5414470B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To rise the accuracy of a pattern formed with the electron beam exposure by using a simple irradiation pattern which prevents "ooze out effect".
COPYRIGHT: (C)1976,JPO&Japio
JP50072575A 1975-06-14 1975-06-14 Electron beam exposure method Granted JPS51148365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50072575A JPS51148365A (en) 1975-06-14 1975-06-14 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50072575A JPS51148365A (en) 1975-06-14 1975-06-14 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS51148365A true JPS51148365A (en) 1976-12-20
JPS5414470B2 JPS5414470B2 (en) 1979-06-07

Family

ID=13493306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50072575A Granted JPS51148365A (en) 1975-06-14 1975-06-14 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS51148365A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57208132A (en) * 1981-06-17 1982-12-21 Toshiba Corp Electron-beam exposure apparatus
JPS5861628A (en) * 1981-10-08 1983-04-12 Nippon Telegr & Teleph Corp <Ntt> Correction of proximity effect at electron beam exposure
JPS5984518A (en) * 1982-11-03 1984-05-16 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Method of approaching and correcting electronic beam lithography
JP2000214574A (en) * 1999-01-22 2000-08-04 Nec Corp Data formation for drawing pattern
JP4870148B2 (en) * 2006-02-22 2012-02-08 パナソニック株式会社 Packing equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57208132A (en) * 1981-06-17 1982-12-21 Toshiba Corp Electron-beam exposure apparatus
JPS5861628A (en) * 1981-10-08 1983-04-12 Nippon Telegr & Teleph Corp <Ntt> Correction of proximity effect at electron beam exposure
JPS5984518A (en) * 1982-11-03 1984-05-16 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Method of approaching and correcting electronic beam lithography
JP2000214574A (en) * 1999-01-22 2000-08-04 Nec Corp Data formation for drawing pattern
JP4870148B2 (en) * 2006-02-22 2012-02-08 パナソニック株式会社 Packing equipment

Also Published As

Publication number Publication date
JPS5414470B2 (en) 1979-06-07

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