JPS5364676A - Treating apparatus in gas phase - Google Patents

Treating apparatus in gas phase

Info

Publication number
JPS5364676A
JPS5364676A JP13957676A JP13957676A JPS5364676A JP S5364676 A JPS5364676 A JP S5364676A JP 13957676 A JP13957676 A JP 13957676A JP 13957676 A JP13957676 A JP 13957676A JP S5364676 A JPS5364676 A JP S5364676A
Authority
JP
Japan
Prior art keywords
gas phase
treating apparatus
uniform
make
treating chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13957676A
Other languages
Japanese (ja)
Inventor
Yasuo Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13957676A priority Critical patent/JPS5364676A/en
Publication of JPS5364676A publication Critical patent/JPS5364676A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To make gas circulation at each part in a treating chamber uniform so as to make treating effect for material to be treated uniform by installing plural gas feeeding holes at nearly symmetrical position on both sides of inside wall of cylindrical treating chamber along the bus bar.
COPYRIGHT: (C)1978,JPO&Japio
JP13957676A 1976-11-22 1976-11-22 Treating apparatus in gas phase Pending JPS5364676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13957676A JPS5364676A (en) 1976-11-22 1976-11-22 Treating apparatus in gas phase

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13957676A JPS5364676A (en) 1976-11-22 1976-11-22 Treating apparatus in gas phase

Publications (1)

Publication Number Publication Date
JPS5364676A true JPS5364676A (en) 1978-06-09

Family

ID=15248468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13957676A Pending JPS5364676A (en) 1976-11-22 1976-11-22 Treating apparatus in gas phase

Country Status (1)

Country Link
JP (1) JPS5364676A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717134A (en) * 1980-07-04 1982-01-28 Kokusai Electric Co Ltd Device for decompression and reaction
JPS5956576A (en) * 1982-08-27 1984-04-02 Yokogawa Hewlett Packard Ltd Formation of thin film
JPS5969494A (en) * 1982-10-14 1984-04-19 Ulvac Corp Reaction and treatment apparatus for low pressure gas or vapor
JPS6010715A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Device for chemical gas-phase growth
JPS6033352A (en) * 1983-08-02 1985-02-20 Kokusai Electric Co Ltd Low pressure CVD equipment
JPS60219747A (en) * 1984-04-16 1985-11-02 Plasma Syst:Kk Controlling method for vacuum degree in treatment chamber of semiconductor production equipment and device therefor
JPS60243272A (en) * 1984-05-04 1985-12-03 アニコン・インコーポレーテツド Chemically vapor deposition wafer boat
JPS6144179A (en) * 1984-07-06 1986-03-03 アニコン・インコ−ポレ−テツド Chemical vapor deposition wafer boat
JP2023046537A (en) * 2021-09-24 2023-04-05 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method and substrate processing apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717134A (en) * 1980-07-04 1982-01-28 Kokusai Electric Co Ltd Device for decompression and reaction
JPS5956576A (en) * 1982-08-27 1984-04-02 Yokogawa Hewlett Packard Ltd Formation of thin film
JPS5969494A (en) * 1982-10-14 1984-04-19 Ulvac Corp Reaction and treatment apparatus for low pressure gas or vapor
JPS6010715A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Device for chemical gas-phase growth
JPS6033352A (en) * 1983-08-02 1985-02-20 Kokusai Electric Co Ltd Low pressure CVD equipment
JPS60219747A (en) * 1984-04-16 1985-11-02 Plasma Syst:Kk Controlling method for vacuum degree in treatment chamber of semiconductor production equipment and device therefor
JPS60243272A (en) * 1984-05-04 1985-12-03 アニコン・インコーポレーテツド Chemically vapor deposition wafer boat
JPS6144179A (en) * 1984-07-06 1986-03-03 アニコン・インコ−ポレ−テツド Chemical vapor deposition wafer boat
JP2023046537A (en) * 2021-09-24 2023-04-05 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method and substrate processing apparatus

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