JPS5367373A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5367373A JPS5367373A JP14230476A JP14230476A JPS5367373A JP S5367373 A JPS5367373 A JP S5367373A JP 14230476 A JP14230476 A JP 14230476A JP 14230476 A JP14230476 A JP 14230476A JP S5367373 A JPS5367373 A JP S5367373A
- Authority
- JP
- Japan
- Prior art keywords
- drain
- semiconductor device
- layer
- mosfet
- gate electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE: To increase the drain dielectric strength and drain current of a MOSFET by providing the diffused layer, which has thinner impurity density and deeper diffusion depth than the drain layer, to the region overlapping the gate electrode.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14230476A JPS5367373A (en) | 1976-11-29 | 1976-11-29 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14230476A JPS5367373A (en) | 1976-11-29 | 1976-11-29 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5367373A true JPS5367373A (en) | 1978-06-15 |
Family
ID=15312245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14230476A Pending JPS5367373A (en) | 1976-11-29 | 1976-11-29 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5367373A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887875A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Twin-gate type mis semiconductor device |
| WO2003021685A1 (en) * | 2001-08-30 | 2003-03-13 | Sony Corporation | Semiconductor device and production method thereof |
-
1976
- 1976-11-29 JP JP14230476A patent/JPS5367373A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887875A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Twin-gate type mis semiconductor device |
| WO2003021685A1 (en) * | 2001-08-30 | 2003-03-13 | Sony Corporation | Semiconductor device and production method thereof |
| US6869847B2 (en) | 2001-08-30 | 2005-03-22 | Sony Corporation | Semiconductor device manufacturing method thereof |
| US7122861B2 (en) | 2001-08-30 | 2006-10-17 | Sony Corporation | Semiconductor device and manufacturing method thereof |
| CN1312777C (en) * | 2001-08-30 | 2007-04-25 | 索尼株式会社 | Semiconductor device and manufacturing method thereof |
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