JPS5368172A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5368172A JPS5368172A JP14411176A JP14411176A JPS5368172A JP S5368172 A JPS5368172 A JP S5368172A JP 14411176 A JP14411176 A JP 14411176A JP 14411176 A JP14411176 A JP 14411176A JP S5368172 A JPS5368172 A JP S5368172A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- photoresist film
- film
- react
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To form fine patterns by providing a resin thin-film which does not react with the photoresist film of a required thickness and transmits ultraviolet rays on said photoresist film.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14411176A JPS5368172A (en) | 1976-11-30 | 1976-11-30 | Production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14411176A JPS5368172A (en) | 1976-11-30 | 1976-11-30 | Production of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5368172A true JPS5368172A (en) | 1978-06-17 |
Family
ID=15354430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14411176A Pending JPS5368172A (en) | 1976-11-30 | 1976-11-30 | Production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5368172A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5749980A (en) * | 1980-07-14 | 1982-03-24 | Hughes Aircraft Co | Holographic exposure device and method of producing same |
| JPH03222409A (en) * | 1990-01-29 | 1991-10-01 | Nec Corp | Manufacture of semiconductor device |
-
1976
- 1976-11-30 JP JP14411176A patent/JPS5368172A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5749980A (en) * | 1980-07-14 | 1982-03-24 | Hughes Aircraft Co | Holographic exposure device and method of producing same |
| JPH03222409A (en) * | 1990-01-29 | 1991-10-01 | Nec Corp | Manufacture of semiconductor device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5313424A (en) | Photosensitive element of selenium for electronic photography | |
| JPS5228875A (en) | Mask | |
| JPS53119686A (en) | Production of semiconductor device | |
| JPS5226191A (en) | Package of photo-semiconductor element | |
| JPS5368172A (en) | Production of semiconductor device | |
| JPS5314568A (en) | Photolithography treatment system device | |
| JPS5324782A (en) | Forming method of high molecular film patterns by negative resist | |
| JPS5348458A (en) | Production of semiconductor device | |
| JPS5345174A (en) | Moisture resistant semiconductor device | |
| JPS5347774A (en) | Production of semiconductor device | |
| JPS5429976A (en) | Manufacture of semiconductor device | |
| JPS52153707A (en) | Magnetic film and its manufacture | |
| JPS5356977A (en) | Production of semiconductor device | |
| JPS5255381A (en) | Photo exposure method | |
| JPS532079A (en) | Frame structure for semiconductor device and its manufacture | |
| JPS5379375A (en) | Semiconductor device | |
| JPS5411672A (en) | Manufacture for semiconductor device | |
| JPS5243427A (en) | Method for photoengraving light sensitive resin | |
| JPS5338277A (en) | Production of semiconductor device | |
| JPS5330874A (en) | Semiconductor element mounting device | |
| JPS533772A (en) | Production of semiconductor device | |
| JPS5329673A (en) | Production of semiconductor device | |
| JPS5361968A (en) | Production of semiconductor device | |
| JPS5261965A (en) | Production of semiconductor device | |
| JPS5316631A (en) | Photographic exposure method |