JPS5392390A - Continuous evaporating apparatus - Google Patents

Continuous evaporating apparatus

Info

Publication number
JPS5392390A
JPS5392390A JP13548077A JP13548077A JPS5392390A JP S5392390 A JPS5392390 A JP S5392390A JP 13548077 A JP13548077 A JP 13548077A JP 13548077 A JP13548077 A JP 13548077A JP S5392390 A JPS5392390 A JP S5392390A
Authority
JP
Japan
Prior art keywords
evaporating apparatus
continuous evaporating
substratum
evaporating
continuous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13548077A
Other languages
Japanese (ja)
Inventor
Mitsuo Kakehi
Keijiro Nishida
Tadayoshi Kasahara
Masao Shimabayashi
Ryozo Hiraga
Tomomasa Nakano
Ichiro Komatsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP13548077A priority Critical patent/JPS5392390A/en
Publication of JPS5392390A publication Critical patent/JPS5392390A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide an evaporating apparatus which is capable of evaporating two sides of a substratum efficiently in a short time by constituting the transferring means for the substratum within heating chamber of a circulation circuit.
JP13548077A 1977-11-11 1977-11-11 Continuous evaporating apparatus Pending JPS5392390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13548077A JPS5392390A (en) 1977-11-11 1977-11-11 Continuous evaporating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13548077A JPS5392390A (en) 1977-11-11 1977-11-11 Continuous evaporating apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4867473A Division JPS5315466B2 (en) 1973-04-28 1973-04-28

Publications (1)

Publication Number Publication Date
JPS5392390A true JPS5392390A (en) 1978-08-14

Family

ID=15152692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13548077A Pending JPS5392390A (en) 1977-11-11 1977-11-11 Continuous evaporating apparatus

Country Status (1)

Country Link
JP (1) JPS5392390A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230977A (en) * 1986-04-01 1987-10-09 Seiko Epson Corp Thin film producing device
JP2013174668A (en) * 2012-02-23 2013-09-05 Asahi Glass Co Ltd Production apparatus and production method for fluorine-containing organic silicon compound thin film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49134579A (en) * 1973-04-28 1974-12-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49134579A (en) * 1973-04-28 1974-12-25

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230977A (en) * 1986-04-01 1987-10-09 Seiko Epson Corp Thin film producing device
JP2013174668A (en) * 2012-02-23 2013-09-05 Asahi Glass Co Ltd Production apparatus and production method for fluorine-containing organic silicon compound thin film

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