JPS53976A - Dry developing method - Google Patents

Dry developing method

Info

Publication number
JPS53976A
JPS53976A JP7446576A JP7446576A JPS53976A JP S53976 A JPS53976 A JP S53976A JP 7446576 A JP7446576 A JP 7446576A JP 7446576 A JP7446576 A JP 7446576A JP S53976 A JPS53976 A JP S53976A
Authority
JP
Japan
Prior art keywords
developing method
dry developing
type photoresist
patten
volatilization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7446576A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7446576A priority Critical patent/JPS53976A/en
Publication of JPS53976A publication Critical patent/JPS53976A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prepare the same patten as that of a negative type photoresist by applying heat and light to the unexposed portion of a positive type photoresist so as to permit decomposition and volatilization thereof.
COPYRIGHT: (C)1978,JPO&Japio
JP7446576A 1976-06-25 1976-06-25 Dry developing method Pending JPS53976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7446576A JPS53976A (en) 1976-06-25 1976-06-25 Dry developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7446576A JPS53976A (en) 1976-06-25 1976-06-25 Dry developing method

Publications (1)

Publication Number Publication Date
JPS53976A true JPS53976A (en) 1978-01-07

Family

ID=13548020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7446576A Pending JPS53976A (en) 1976-06-25 1976-06-25 Dry developing method

Country Status (1)

Country Link
JP (1) JPS53976A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JP2021513677A (en) * 2018-01-31 2021-05-27 ネーデルランドセ オルガニサティエ フォール トエゲパスト−ナトールヴェテンシャッペリク オンデルゾエク ティエヌオー Methods and equipment for generating and sintering fine lines and patterns

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JP2021513677A (en) * 2018-01-31 2021-05-27 ネーデルランドセ オルガニサティエ フォール トエゲパスト−ナトールヴェテンシャッペリク オンデルゾエク ティエヌオー Methods and equipment for generating and sintering fine lines and patterns
US11691199B2 (en) 2018-01-31 2023-07-04 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Method and apparatus for creating and sintering fine lines and patterns

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