JPS544063A - Low pressure deposition method for impurity - Google Patents

Low pressure deposition method for impurity

Info

Publication number
JPS544063A
JPS544063A JP6890877A JP6890877A JPS544063A JP S544063 A JPS544063 A JP S544063A JP 6890877 A JP6890877 A JP 6890877A JP 6890877 A JP6890877 A JP 6890877A JP S544063 A JPS544063 A JP S544063A
Authority
JP
Japan
Prior art keywords
impurity
deposition method
low pressure
pressure deposition
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6890877A
Other languages
Japanese (ja)
Inventor
Kaoru Niino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6890877A priority Critical patent/JPS544063A/en
Publication of JPS544063A publication Critical patent/JPS544063A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To reduce the dispersion in the specific resistance of diffusion layer, by performing deposition at a low temperature at first and performing it at normal temperature after forming a given film thickness, in impurity deposition method.
COPYRIGHT: (C)1979,JPO&Japio
JP6890877A 1977-06-13 1977-06-13 Low pressure deposition method for impurity Pending JPS544063A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6890877A JPS544063A (en) 1977-06-13 1977-06-13 Low pressure deposition method for impurity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6890877A JPS544063A (en) 1977-06-13 1977-06-13 Low pressure deposition method for impurity

Publications (1)

Publication Number Publication Date
JPS544063A true JPS544063A (en) 1979-01-12

Family

ID=13387212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6890877A Pending JPS544063A (en) 1977-06-13 1977-06-13 Low pressure deposition method for impurity

Country Status (1)

Country Link
JP (1) JPS544063A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112466985A (en) * 2020-10-30 2021-03-09 江苏润阳悦达光伏科技有限公司 Low-pressure diffusion process for improving uniformity of diffusion sheet resistance single chip

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112466985A (en) * 2020-10-30 2021-03-09 江苏润阳悦达光伏科技有限公司 Low-pressure diffusion process for improving uniformity of diffusion sheet resistance single chip

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