JPS5449071A - Processing method by aqueous solution of photo resist layer - Google Patents

Processing method by aqueous solution of photo resist layer

Info

Publication number: JPS5449071A
Authority: JP; Japan
Prior art keywords: resist film; group; solution; removement; wafer
Prior art date: 1977-09-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP11511277A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6156614B2 (2

Inventor

Kinnosuke Okutsu

Sakae Sato

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Toshiba Corp

Original Assignee

Toshiba Corp

Tokyo Shibaura Electric Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-09-27

Filing date

1977-09-27

Publication date

1979-04-18

1977-09-27 Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp

1977-09-27 Priority to JP11511277A priority Critical patent/JPS5449071A/ja

1979-04-18 Publication of JPS5449071A publication Critical patent/JPS5449071A/ja

1986-12-03 Publication of JPS6156614B2 publication Critical patent/JPS6156614B2/ja

Status Granted legal-status Critical Current

Links

229920002120 photoresistant polymer Polymers 0.000 title abstract 2
239000007864 aqueous solution Substances 0.000 title 1
238000003672 processing method Methods 0.000 title 1
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 4
235000012431 wafers Nutrition 0.000 abstract 4
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract 3
238000005406 washing Methods 0.000 abstract 3
239000011259 mixed solution Substances 0.000 abstract 2
239000004065 semiconductor Substances 0.000 abstract 2
239000000243 solution Substances 0.000 abstract 2
239000012190 activator Substances 0.000 abstract 1
125000000217 alkyl group Chemical group 0.000 abstract 1
125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
239000007788 liquid Substances 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
230000036632 reaction speed Effects 0.000 abstract 1
238000005507 spraying Methods 0.000 abstract 1

Landscapes

Photosensitive Polymer And Photoresist Processing (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP11511277A 1977-09-27 1977-09-27 Processing method by aqueous solution of photo resist layer Granted JPS5449071A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP11511277A JPS5449071A (en)	1977-09-27	1977-09-27	Processing method by aqueous solution of photo resist layer

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP11511277A JPS5449071A (en)	1977-09-27	1977-09-27	Processing method by aqueous solution of photo resist layer

Publications (2)

Publication Number	Publication Date
JPS5449071A true JPS5449071A (en)	1979-04-18
JPS6156614B2 JPS6156614B2 (2)	1986-12-03

Family

ID=14654525

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP11511277A Granted JPS5449071A (en)	1977-09-27	1977-09-27	Processing method by aqueous solution of photo resist layer

Country Status (1)

Country	Link
JP (1)	JPS5449071A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57173660U (2) *	1981-04-28	1982-11-01
JPS58158440U (ja) *	1982-04-16	1983-10-22	沖電気工業株式会社	ウエハ洗浄装置

1977
- 1977-09-27 JP JP11511277A patent/JPS5449071A/ja active Granted

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57173660U (2) *	1981-04-28	1982-11-01
JPS58158440U (ja) *	1982-04-16	1983-10-22	沖電気工業株式会社	ウエハ洗浄装置

Also Published As

Publication number	Publication date
JPS6156614B2 (2)	1986-12-03

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