JPS5454580A - Cassette chucking device in electron beam lithography apparatus - Google Patents
Cassette chucking device in electron beam lithography apparatusInfo
- Publication number
- JPS5454580A JPS5454580A JP12095777A JP12095777A JPS5454580A JP S5454580 A JPS5454580 A JP S5454580A JP 12095777 A JP12095777 A JP 12095777A JP 12095777 A JP12095777 A JP 12095777A JP S5454580 A JPS5454580 A JP S5454580A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- face
- lithographic
- chucking device
- separating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To avert damaging of lithographic face by separating the lithographic face from a reference plane at the inserting or removing of a cassette, and letting the cassette be closely contacted softly with a pressing means which is actuated by pressure differences between the atmosphere and vacuum after it has been inserted.
CONSTITUTION: The cassette 6a which is contained in a cassette magazine 10 is inserted into a cassette chucking device 5 with a cassette mounting/dismounting bar 15 after opening an air lock device 8. Next, air is introduced into the space 23 in the device 5 through pipe and through-hole 24 and the casette 6a is pushed up with a leaf spring 26 by extending a bellows 21. This causes a mask 19 to contact the protruding face of a cover 17 and the lithographic face to secure in parallel with the face of a working table 4 within the parallel accuracy of the base 16 and cover 17. In this state, lithography is performed with an electron optical system 1 and if the lthography is finished, the inside of the space 23 is evacuated and the belows 21 is returned to the original state, separating the lithographic face and the reference face. Thereafter, the cassette 6a is removed and is replaced with the next cassette 6b
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12095777A JPS5454580A (en) | 1977-10-11 | 1977-10-11 | Cassette chucking device in electron beam lithography apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12095777A JPS5454580A (en) | 1977-10-11 | 1977-10-11 | Cassette chucking device in electron beam lithography apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5454580A true JPS5454580A (en) | 1979-04-28 |
Family
ID=14799163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12095777A Pending JPS5454580A (en) | 1977-10-11 | 1977-10-11 | Cassette chucking device in electron beam lithography apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5454580A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55107230A (en) * | 1979-02-09 | 1980-08-16 | Jeol Ltd | Sample holder in electron ray exposing device and the like |
| JPS5654037A (en) * | 1979-10-08 | 1981-05-13 | Jeol Ltd | Sample holder in electron ray exposure device, etc. |
| JPS5994416A (en) * | 1983-10-28 | 1984-05-31 | Hitachi Ltd | Supporter for mask |
| JPS617026U (en) * | 1984-06-18 | 1986-01-16 | 東芝機械株式会社 | Cassette for electron beam lithography equipment |
| JP2007112509A (en) * | 2005-09-22 | 2007-05-10 | Inoac Corp | Shock absorbing material for packaging box |
-
1977
- 1977-10-11 JP JP12095777A patent/JPS5454580A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55107230A (en) * | 1979-02-09 | 1980-08-16 | Jeol Ltd | Sample holder in electron ray exposing device and the like |
| JPS5654037A (en) * | 1979-10-08 | 1981-05-13 | Jeol Ltd | Sample holder in electron ray exposure device, etc. |
| JPS5994416A (en) * | 1983-10-28 | 1984-05-31 | Hitachi Ltd | Supporter for mask |
| JPS617026U (en) * | 1984-06-18 | 1986-01-16 | 東芝機械株式会社 | Cassette for electron beam lithography equipment |
| JP2007112509A (en) * | 2005-09-22 | 2007-05-10 | Inoac Corp | Shock absorbing material for packaging box |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3866428D1 (en) | OPERATION OF AN ION TRAP MASS SPECTROMETER BY MEANS OF CHEMICAL IONISATION. | |
| DE3866427D1 (en) | METHOD FOR OPERATING AN ION TRAP MASS SPECTROMETER. | |
| GB2021072A (en) | A storage device for tape cassettes and/or cartridges | |
| JPS56106150A (en) | Annular guide rail | |
| JPS57169242A (en) | X-ray transferring device | |
| JPS52155420A (en) | Gas enclosing method for enclosing type cylinder | |
| SE8405864L (en) | PROCEDURE AND DEVICE FOR REDUCING POLLUTION FROM AN ISOSTATIC PRESSURE CONTAINER | |
| JPS6251144A (en) | mass spectrometer | |
| JPS5447581A (en) | Mask aligner | |
| JPS51120288A (en) | Analyzer direct-coupled with gas chromatograph mass analysis-meter | |
| JPS52125269A (en) | Removing device for projecting defects from wafer | |
| JPS5587435A (en) | Method of producing semiconductor device | |
| JPS51148673A (en) | A wet treatment process for exhaust gas | |
| JPS5474795A (en) | Sample tube holder in nuclear magnetic resonator | |
| JP2002365182A5 (en) | ||
| JP3799317B2 (en) | Column positioning method and jig for ion source for mass spectrometer | |
| JPS5368981A (en) | Vacuum contact printing apparatus | |
| JPS5360162A (en) | Electron beam irradiation device | |
| SU682791A1 (en) | Method of preparing replicas of spheroidal cast iron | |
| JPS55165630A (en) | Apparatus for electron beam exposure | |
| JPS5797624A (en) | Electron beam exposure | |
| JPH04262253A (en) | Glow-discharge mass spectrometry | |
| JPS5297785A (en) | Ion source device | |
| JPS51146296A (en) | Metastable ion detecting device for mass spectrometer | |
| JPS5250074A (en) | Apparatus for removing a fume gas |