JPS5461477A - Method of machining by electron beam or ion beam irradiation - Google Patents

Method of machining by electron beam or ion beam irradiation

Info

Publication number
JPS5461477A
JPS5461477A JP12754377A JP12754377A JPS5461477A JP S5461477 A JPS5461477 A JP S5461477A JP 12754377 A JP12754377 A JP 12754377A JP 12754377 A JP12754377 A JP 12754377A JP S5461477 A JPS5461477 A JP S5461477A
Authority
JP
Japan
Prior art keywords
machining
electron beam
ion beam
beam irradiation
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12754377A
Other languages
Japanese (ja)
Inventor
Fumio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP12754377A priority Critical patent/JPS5461477A/en
Publication of JPS5461477A publication Critical patent/JPS5461477A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP12754377A 1977-10-26 1977-10-26 Method of machining by electron beam or ion beam irradiation Pending JPS5461477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12754377A JPS5461477A (en) 1977-10-26 1977-10-26 Method of machining by electron beam or ion beam irradiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12754377A JPS5461477A (en) 1977-10-26 1977-10-26 Method of machining by electron beam or ion beam irradiation

Publications (1)

Publication Number Publication Date
JPS5461477A true JPS5461477A (en) 1979-05-17

Family

ID=14962599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12754377A Pending JPS5461477A (en) 1977-10-26 1977-10-26 Method of machining by electron beam or ion beam irradiation

Country Status (1)

Country Link
JP (1) JPS5461477A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615045A (en) * 1979-07-17 1981-02-13 Mitsubishi Electric Corp Formation of pattern
JPS5650514A (en) * 1979-10-01 1981-05-07 Mitsubishi Electric Corp Formation of fine pattern
JPS5656636A (en) * 1979-10-13 1981-05-18 Mitsubishi Electric Corp Processing method of fine pattern
JPS5666038A (en) * 1979-11-01 1981-06-04 Mitsubishi Electric Corp Formation of micro-pattern
JPS5731142A (en) * 1980-07-31 1982-02-19 Fujitsu Ltd Manufacture of semiconductor device
JP2001105400A (en) * 1998-12-25 2001-04-17 Canon Inc Method for producing pores, pores produced by the production method, and structure having the pores

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615045A (en) * 1979-07-17 1981-02-13 Mitsubishi Electric Corp Formation of pattern
JPS5650514A (en) * 1979-10-01 1981-05-07 Mitsubishi Electric Corp Formation of fine pattern
JPS5656636A (en) * 1979-10-13 1981-05-18 Mitsubishi Electric Corp Processing method of fine pattern
JPS5666038A (en) * 1979-11-01 1981-06-04 Mitsubishi Electric Corp Formation of micro-pattern
JPS5731142A (en) * 1980-07-31 1982-02-19 Fujitsu Ltd Manufacture of semiconductor device
JP2001105400A (en) * 1998-12-25 2001-04-17 Canon Inc Method for producing pores, pores produced by the production method, and structure having the pores

Similar Documents

Publication Publication Date Title
JPS566441A (en) Reactive ion beam etching method
JPS53136799A (en) Ion beam bombardment device
JPS5441076A (en) Method of radiating charged beam using complementary mask
JPS5539694A (en) Method of breaking ion beam
JPS53126598A (en) Method of forming holes by laser beam
DE3570153D1 (en) Device for the irradiation of matter by an electron beam
GB2011125B (en) Apparatus for electron beam lithograhy
JPS5250289A (en) Method of irradiating corpuscular beam
DE3066694D1 (en) Method of electron beam exposure
DE3063103D1 (en) Electron beam exposure method
JPS5461477A (en) Method of machining by electron beam or ion beam irradiation
DE3062881D1 (en) Electron beam irradiation apparatus
DE2861299D1 (en) Apparatus for irradiation of a target with ions
DE3070093D1 (en) Method of treating a workpiece with an electron beam
JPS53141142A (en) Electron irradiation welding method by electron beam and its device
JPS534076A (en) Method of irradiation of accelerated electron beam on to circular portion of cylindrical body
JPS5650794A (en) Method of controlling electron beam welding
JPS5238442A (en) Electron beam welding method
GB2089110B (en) High power pulsed electron beam annealing system
JPS5457950A (en) Method of focusing in electron beam unit
DE3170405D1 (en) An electron beam exposure method
JPS51151237A (en) Method of electron beam welding
JPS5651700A (en) Electron beam irradiation device
JPS53140993A (en) Method of generating alphaaray ion
JPS5436188A (en) Method of exposing electron beam