JPS5475989A - Pattern production method - Google Patents

Pattern production method

Info

Publication number
JPS5475989A
JPS5475989A JP14273777A JP14273777A JPS5475989A JP S5475989 A JPS5475989 A JP S5475989A JP 14273777 A JP14273777 A JP 14273777A JP 14273777 A JP14273777 A JP 14273777A JP S5475989 A JPS5475989 A JP S5475989A
Authority
JP
Japan
Prior art keywords
film
pattern
ultraviolet rays
minute
subjected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14273777A
Other languages
Japanese (ja)
Inventor
Hideki Nishida
Norikazu Tsumita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14273777A priority Critical patent/JPS5475989A/en
Publication of JPS5475989A publication Critical patent/JPS5475989A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Thin Magnetic Films (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a minute pattern suitable for magnetic bubble elements and semiconductor devices by using polymethyl isopropenyl ketone as a photo resistor and generating a photochemical reaction by ultraviolet rays having a wavelength shorter than normal ultraviolet rays and performing ion-etching after development.
CONSTITUTION: A Permalloy film where a pattern will be formed is caused to adhere onto a magnetic garnet film through a SiO2 film, and a polymethyl isopropenyl ketone film is applied onto this film and is subjected to pre-bake at 170°C for about 20 minutes. Next, a mask of a chromium film which is caused to adhere onto a quartz glass plate, which does not absorb short-wavelength ultraviolet rays, in a prescribed pattern is used to perform a contact printing exposure for a minute by a Xe-Hg lamp light source. After that, the irradiated part of the ketone film is developed and removed, and the exposed Permalloy film is subjected to ion-milling and is made into a desired pattern. Thus, even a minute pattern with line width 0.5μm can be obtained.
COPYRIGHT: (C)1979,JPO&Japio
JP14273777A 1977-11-30 1977-11-30 Pattern production method Pending JPS5475989A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14273777A JPS5475989A (en) 1977-11-30 1977-11-30 Pattern production method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14273777A JPS5475989A (en) 1977-11-30 1977-11-30 Pattern production method

Publications (1)

Publication Number Publication Date
JPS5475989A true JPS5475989A (en) 1979-06-18

Family

ID=15322398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14273777A Pending JPS5475989A (en) 1977-11-30 1977-11-30 Pattern production method

Country Status (1)

Country Link
JP (1) JPS5475989A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62232124A (en) * 1986-04-01 1987-10-12 Hitachi Ltd Method for manufacturing thin film circuits
US7367825B2 (en) 2004-01-09 2008-05-06 Toyota Jidosha Kabushiki Kaisha Connector connection structure

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148279A (en) * 1974-09-26 1976-04-24 Ibm

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148279A (en) * 1974-09-26 1976-04-24 Ibm

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62232124A (en) * 1986-04-01 1987-10-12 Hitachi Ltd Method for manufacturing thin film circuits
US7367825B2 (en) 2004-01-09 2008-05-06 Toyota Jidosha Kabushiki Kaisha Connector connection structure

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