JPS5476072A - Manufacturing unit for semiconductor - Google Patents

Manufacturing unit for semiconductor

Info

Publication number
JPS5476072A
JPS5476072A JP14412877A JP14412877A JPS5476072A JP S5476072 A JPS5476072 A JP S5476072A JP 14412877 A JP14412877 A JP 14412877A JP 14412877 A JP14412877 A JP 14412877A JP S5476072 A JPS5476072 A JP S5476072A
Authority
JP
Japan
Prior art keywords
water
substrate
water cleaning
vessel
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14412877A
Other languages
Japanese (ja)
Inventor
Hiroshi Koshimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14412877A priority Critical patent/JPS5476072A/en
Publication of JPS5476072A publication Critical patent/JPS5476072A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To enable perfect water cleaning, by washing the substrate in the water cleaning vessel by flowing water, after etching the substrate.
CONSTITUTION: In the automatic unit, the substrate 2 is sprayed and etched 3 on the belt and it is dried via the water cleaning vessel 5, after the front and rear of it being cleaned with the pure water spray 4. Further, water is always overflowed and greater water cleaning effect is made. Further, when the substrate enters the water vessel 5, the surface of it is pushed down with the pure water press 7 and the substrate is carred in water with the projection 10 of the belt. With this method, perfect water cleaning is made.
COPYRIGHT: (C)1979,JPO&Japio
JP14412877A 1977-11-30 1977-11-30 Manufacturing unit for semiconductor Pending JPS5476072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14412877A JPS5476072A (en) 1977-11-30 1977-11-30 Manufacturing unit for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14412877A JPS5476072A (en) 1977-11-30 1977-11-30 Manufacturing unit for semiconductor

Publications (1)

Publication Number Publication Date
JPS5476072A true JPS5476072A (en) 1979-06-18

Family

ID=15354842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14412877A Pending JPS5476072A (en) 1977-11-30 1977-11-30 Manufacturing unit for semiconductor

Country Status (1)

Country Link
JP (1) JPS5476072A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694040U (en) * 1979-12-19 1981-07-25

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4944527U (en) * 1972-07-20 1974-04-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4944527U (en) * 1972-07-20 1974-04-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694040U (en) * 1979-12-19 1981-07-25

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