JPS5483772A - Electron-beam exposure unit - Google Patents

Electron-beam exposure unit

Info

Publication number
JPS5483772A
JPS5483772A JP15155477A JP15155477A JPS5483772A JP S5483772 A JPS5483772 A JP S5483772A JP 15155477 A JP15155477 A JP 15155477A JP 15155477 A JP15155477 A JP 15155477A JP S5483772 A JPS5483772 A JP S5483772A
Authority
JP
Japan
Prior art keywords
pattern
exposure
unit
control signals
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15155477A
Other languages
Japanese (ja)
Other versions
JPS5856966B2 (en
Inventor
Seigo Igaki
Masahiro Okabe
Noriaki Nakayama
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP52151554A priority Critical patent/JPS5856966B2/en
Publication of JPS5483772A publication Critical patent/JPS5483772A/en
Publication of JPS5856966B2 publication Critical patent/JPS5856966B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To control a beam shape and exposure position by deciding the number of times of unit size exposure and an excessive pattern judgeing from contents of a square-size register and unit-size register.
CONSTITUTION: Deflect 9 is supplied, from equare-size control DA converter 28, with control signals (ax) and (ay) for the optimum dividing unit pattern of an expodure pattern and control signals (bx) and (by) for the final excessive pattern. The beam state of the 2nd opening board 10 is restricted by opening 24, and the beam intensity is shown by distribution 25. The exposure beams pass through deflector 11 and focus on the position exposure pattern 14 on sample 3 by lens 12. Defector 11 is supplied with control signals X and Y from positioning DA converter 29, the unit pattern is exposed to exposure beams in sequence, and the excessive pattern is finally. The exposure distribution at this time shows shape 27. In this method, the large exposure pattern can be exposed at a high speed with highly- efficient electron density.
COPYRIGHT: (C)1979,JPO&Japio
JP52151554A 1977-12-16 1977-12-16 Electron beam exposure equipment Expired JPS5856966B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52151554A JPS5856966B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52151554A JPS5856966B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5483772A true JPS5483772A (en) 1979-07-04
JPS5856966B2 JPS5856966B2 (en) 1983-12-17

Family

ID=15521051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52151554A Expired JPS5856966B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5856966B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61146237A (en) * 1984-12-20 1986-07-03 松下電器産業株式会社 Ultrasonic probe

Also Published As

Publication number Publication date
JPS5856966B2 (en) 1983-12-17

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