JPS54861A - Scribing method for semiconductor wafer - Google Patents
Scribing method for semiconductor waferInfo
- Publication number
- JPS54861A JPS54861A JP6591277A JP6591277A JPS54861A JP S54861 A JPS54861 A JP S54861A JP 6591277 A JP6591277 A JP 6591277A JP 6591277 A JP6591277 A JP 6591277A JP S54861 A JPS54861 A JP S54861A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- scribing method
- scribing
- waveform
- secure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Abstract
PURPOSE: To secure a good scribing by giving irradiation of the laser pulse of more than twice onto the same street of the semiconductor substrate through variation of the waveform.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6591277A JPS54861A (en) | 1977-06-03 | 1977-06-03 | Scribing method for semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6591277A JPS54861A (en) | 1977-06-03 | 1977-06-03 | Scribing method for semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS54861A true JPS54861A (en) | 1979-01-06 |
Family
ID=13300645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6591277A Pending JPS54861A (en) | 1977-06-03 | 1977-06-03 | Scribing method for semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54861A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003037085A (en) * | 2001-07-06 | 2003-02-07 | Data Storage Inst | Substrate cutting method and apparatus using laser irradiation |
-
1977
- 1977-06-03 JP JP6591277A patent/JPS54861A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003037085A (en) * | 2001-07-06 | 2003-02-07 | Data Storage Inst | Substrate cutting method and apparatus using laser irradiation |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS53114347A (en) | Working method for semiconductor device | |
| JPS54860A (en) | Scribing method for semiconductor wafer | |
| JPS5437472A (en) | Manufacture of semiconductor | |
| JPS5230167A (en) | Method for production of semiconductor device | |
| JPS5439576A (en) | Inspection method for semiconductor device | |
| JPS5244562A (en) | Epitaxial growth method | |
| JPS51146192A (en) | Diode device fabrication method | |
| JPS5218173A (en) | Soldering method of semiconductor element | |
| JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
| JPS542663A (en) | Positioning method for mounting semiconductor chip | |
| JPS5234585A (en) | Method for checking numbers of operation tools | |
| JPS5218484A (en) | Method of removing sulfur oxides | |
| JPS5432978A (en) | Correcting method for pattern | |
| JPS53136484A (en) | Wafer continuous machining method and unit used for the same | |
| JPS52140275A (en) | Processing method for semiconductor wafer | |
| JPS544062A (en) | Wafer extender | |
| JPS53116790A (en) | Electrical connection method within semiconductor chip | |
| JPS542670A (en) | Plasma etching method | |
| JPS5428584A (en) | Manufacture of semiconductor laser element | |
| JPS5371A (en) | Scribing method of semiconductor wafer | |
| JPS5351425A (en) | Voltage raise circuit | |
| JPS5440566A (en) | Working device for groove of semiconductor wafer | |
| JPS51147190A (en) | Method of manufacturing of integurated circuit for lsi | |
| JPS52136579A (en) | Testing method for beam lead, multichip mounting substrates | |
| JPS5228886A (en) | Method for production of semiconductive emitter device |