JPS5437472A - Manufacture of semiconductor - Google Patents

Manufacture of semiconductor

Info

Publication number
JPS5437472A
JPS5437472A JP10262477A JP10262477A JPS5437472A JP S5437472 A JPS5437472 A JP S5437472A JP 10262477 A JP10262477 A JP 10262477A JP 10262477 A JP10262477 A JP 10262477A JP S5437472 A JPS5437472 A JP S5437472A
Authority
JP
Japan
Prior art keywords
semiconductor
manufacture
insulating layer
irradiating
securing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10262477A
Other languages
Japanese (ja)
Other versions
JPS6146974B2 (en
Inventor
Hiroshi Yamaguchi
Masao Mitani
Yoshiharu Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10262477A priority Critical patent/JPS5437472A/en
Publication of JPS5437472A publication Critical patent/JPS5437472A/en
Publication of JPS6146974B2 publication Critical patent/JPS6146974B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To avoid the step break of the wiring by irradiating the insulating layer through ON/OFF control of the laser spot and then securing a gentle slope for the window-side surface of the insulating layer.
COPYRIGHT: (C)1979,JPO&Japio
JP10262477A 1977-08-29 1977-08-29 Manufacture of semiconductor Granted JPS5437472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10262477A JPS5437472A (en) 1977-08-29 1977-08-29 Manufacture of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10262477A JPS5437472A (en) 1977-08-29 1977-08-29 Manufacture of semiconductor

Publications (2)

Publication Number Publication Date
JPS5437472A true JPS5437472A (en) 1979-03-19
JPS6146974B2 JPS6146974B2 (en) 1986-10-16

Family

ID=14332386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10262477A Granted JPS5437472A (en) 1977-08-29 1977-08-29 Manufacture of semiconductor

Country Status (1)

Country Link
JP (1) JPS5437472A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567438A (en) * 1979-06-28 1981-01-26 Mitsubishi Electric Corp Annealing device for semiconductor which use laser
JPS5930797A (en) * 1982-08-16 1984-02-18 Shin Etsu Handotai Co Ltd Liquid phase epitaxial growth method
JPH03135568A (en) * 1989-06-22 1991-06-10 Digital Equip Corp <Dec> Lithographic technique using laser scanning for manufacturing electronic component, etc.
JP2002162750A (en) * 2000-11-27 2002-06-07 Mitsutoyo Corp Exposure device
JP2008112985A (en) * 2006-10-06 2008-05-15 Semiconductor Energy Lab Co Ltd Exposure equipment, and fabricating method of semiconductor device using exposure equipment
JP2018045254A (en) * 2017-12-11 2018-03-22 株式会社ニコン Pattern drawing device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567438A (en) * 1979-06-28 1981-01-26 Mitsubishi Electric Corp Annealing device for semiconductor which use laser
JPS5930797A (en) * 1982-08-16 1984-02-18 Shin Etsu Handotai Co Ltd Liquid phase epitaxial growth method
JPH03135568A (en) * 1989-06-22 1991-06-10 Digital Equip Corp <Dec> Lithographic technique using laser scanning for manufacturing electronic component, etc.
JP2002162750A (en) * 2000-11-27 2002-06-07 Mitsutoyo Corp Exposure device
JP2008112985A (en) * 2006-10-06 2008-05-15 Semiconductor Energy Lab Co Ltd Exposure equipment, and fabricating method of semiconductor device using exposure equipment
JP2018045254A (en) * 2017-12-11 2018-03-22 株式会社ニコン Pattern drawing device

Also Published As

Publication number Publication date
JPS6146974B2 (en) 1986-10-16

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