JPS551016A - Cleaning method for electron gun and its device - Google Patents

Cleaning method for electron gun and its device

Info

Publication number
JPS551016A
JPS551016A JP7341978A JP7341978A JPS551016A JP S551016 A JPS551016 A JP S551016A JP 7341978 A JP7341978 A JP 7341978A JP 7341978 A JP7341978 A JP 7341978A JP S551016 A JPS551016 A JP S551016A
Authority
JP
Japan
Prior art keywords
whenelt
cylinder
cathode
inner face
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7341978A
Other languages
Japanese (ja)
Inventor
Shizuya Matsuura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7341978A priority Critical patent/JPS551016A/en
Publication of JPS551016A publication Critical patent/JPS551016A/en
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE: To make a removal of contamination stuck to the Whenelt cylinder, by means of discharge made between a cathode and the Whenelt cylinder that encloses the cathode.
CONSTITUTION: With an ambience around the electron gun while being kept at a pressure of vacuum 10-2mmHg, between a cathode 1 and the Whenelt cylinder 2, is applied a relatively low DC voltage (500 to 2,000V) by using a voltage applying method so that the Whenelt cylinder 2 may be in negative potential. And a discharge is caused generating between the cathode 1 and inner face of the Whenelt cylinder 2. The generation of discharge ionizes oxygen and nitrogen atoms that are accelerated in the electric field and collided to the inner face of the Whenelt cylinder 2. In the result, the inner face of the Whenelt cylinder 2 is effected sputtering and etching, with a sticking material of contamination removed and a cleaning operated.
COPYRIGHT: (C)1980,JPO&Japio
JP7341978A 1978-06-16 1978-06-16 Cleaning method for electron gun and its device Pending JPS551016A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7341978A JPS551016A (en) 1978-06-16 1978-06-16 Cleaning method for electron gun and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7341978A JPS551016A (en) 1978-06-16 1978-06-16 Cleaning method for electron gun and its device

Publications (1)

Publication Number Publication Date
JPS551016A true JPS551016A (en) 1980-01-07

Family

ID=13517664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7341978A Pending JPS551016A (en) 1978-06-16 1978-06-16 Cleaning method for electron gun and its device

Country Status (1)

Country Link
JP (1) JPS551016A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1455380A1 (en) * 2003-03-03 2004-09-08 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device with cleaning unit and method of operation thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1455380A1 (en) * 2003-03-03 2004-09-08 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device with cleaning unit and method of operation thereof
WO2004079770A1 (en) * 2003-03-03 2004-09-16 Ict, Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh Charged particle beam device with cleaning unit and method of operation thereof
US7355186B2 (en) 2003-03-03 2008-04-08 Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Charged particle beam device with cleaning unit and method of operation thereof

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