JPS5298475A - Plasma treating apparatus - Google Patents

Plasma treating apparatus

Info

Publication number
JPS5298475A
JPS5298475A JP1485476A JP1485476A JPS5298475A JP S5298475 A JPS5298475 A JP S5298475A JP 1485476 A JP1485476 A JP 1485476A JP 1485476 A JP1485476 A JP 1485476A JP S5298475 A JPS5298475 A JP S5298475A
Authority
JP
Japan
Prior art keywords
treating apparatus
plasma treating
treating
plasmas
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1485476A
Other languages
Japanese (ja)
Inventor
Takashi Tsuchimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1485476A priority Critical patent/JPS5298475A/en
Priority to GB41345/76A priority patent/GB1550853A/en
Priority to US05/729,987 priority patent/US4123316A/en
Publication of JPS5298475A publication Critical patent/JPS5298475A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To produce the device wherein controlling of transport plasmas is easy, treating time is short and putting in and out of wafers are simple, by maintaining a treating chamber provided separately from a plasma generating chamber at a high vacuum and providing spare exhaust chambers.
COPYRIGHT: (C)1977,JPO&Japio
JP1485476A 1975-10-06 1976-02-16 Plasma treating apparatus Pending JPS5298475A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1485476A JPS5298475A (en) 1976-02-16 1976-02-16 Plasma treating apparatus
GB41345/76A GB1550853A (en) 1975-10-06 1976-10-05 Apparatus and process for plasma treatment
US05/729,987 US4123316A (en) 1975-10-06 1976-10-06 Plasma processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1485476A JPS5298475A (en) 1976-02-16 1976-02-16 Plasma treating apparatus

Publications (1)

Publication Number Publication Date
JPS5298475A true JPS5298475A (en) 1977-08-18

Family

ID=11872608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1485476A Pending JPS5298475A (en) 1975-10-06 1976-02-16 Plasma treating apparatus

Country Status (1)

Country Link
JP (1) JPS5298475A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5561026A (en) * 1978-10-30 1980-05-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Gas plasma etching device
JPS6055615A (en) * 1983-09-07 1985-03-30 Sharp Corp Thin film forming device
JPS61222121A (en) * 1985-03-27 1986-10-02 Canon Inc Functional deposit-film and method and apparatus for manufacturing said film
JPS622527A (en) * 1985-06-27 1987-01-08 Mitsubishi Electric Corp Thin film forming equipment
JPS63174321A (en) * 1986-12-11 1988-07-18 クリストファー　デビッド　ドブソン Apparatus and method for ion etching and chemical vapor phase deposition
JPS63234519A (en) * 1987-03-24 1988-09-29 Matsushita Electric Ind Co Ltd Plasma processor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5561026A (en) * 1978-10-30 1980-05-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Gas plasma etching device
JPS6055615A (en) * 1983-09-07 1985-03-30 Sharp Corp Thin film forming device
JPS61222121A (en) * 1985-03-27 1986-10-02 Canon Inc Functional deposit-film and method and apparatus for manufacturing said film
JPS622527A (en) * 1985-06-27 1987-01-08 Mitsubishi Electric Corp Thin film forming equipment
JPS63174321A (en) * 1986-12-11 1988-07-18 クリストファー　デビッド　ドブソン Apparatus and method for ion etching and chemical vapor phase deposition
JPS63234519A (en) * 1987-03-24 1988-09-29 Matsushita Electric Ind Co Ltd Plasma processor

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