JPS55108656A - Resin composition for thermosetting type resist film - Google Patents
Resin composition for thermosetting type resist filmInfo
- Publication number
- JPS55108656A JPS55108656A JP1516479A JP1516479A JPS55108656A JP S55108656 A JPS55108656 A JP S55108656A JP 1516479 A JP1516479 A JP 1516479A JP 1516479 A JP1516479 A JP 1516479A JP S55108656 A JPS55108656 A JP S55108656A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin composition
- methacrylic
- average
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 229920001187 thermosetting polymer Polymers 0.000 title 1
- 229920001577 copolymer Polymers 0.000 abstract 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- 238000002156 mixing Methods 0.000 abstract 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract 1
- 230000004304 visual acuity Effects 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To obtain the title resin composition having sufficient resolving power and high sensitivity by blending a specified methacrylic polymer and an aliphatic dicarboxylic acid.
CONSTITUTION: An aliphatic dicarboxylic acid such as methacrylic acid dimer or 1,2-ethanedicarboxylic acid represented by formula V or VI (where n is 1W12) is blended into a methacrylic copolymer containing methyl methacrylate and methacrylic acid ester, in a molar ratio of about 1:0.05W0.2, having a hydroxyl group at its side chain and represented by formula I (where n is 2W5) or formula II, III or IV (where n is 2W4). The blending ratio of the acid to the ester in the copolymer is about 0.4W0.6 by mol. The copolymer preferably has a no. average MW (Mn) of about 4000W100000 and a wt. average MW to no. average MW ratio (Mw/Mn) of about 3 or less.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1516479A JPS55108656A (en) | 1979-02-13 | 1979-02-13 | Resin composition for thermosetting type resist film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1516479A JPS55108656A (en) | 1979-02-13 | 1979-02-13 | Resin composition for thermosetting type resist film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55108656A true JPS55108656A (en) | 1980-08-21 |
Family
ID=11881153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1516479A Pending JPS55108656A (en) | 1979-02-13 | 1979-02-13 | Resin composition for thermosetting type resist film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55108656A (en) |
-
1979
- 1979-02-13 JP JP1516479A patent/JPS55108656A/en active Pending
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