JPS55110770A - Gas wiping method in hot dipping process - Google Patents

Gas wiping method in hot dipping process

Info

Publication number
JPS55110770A
JPS55110770A JP1784279A JP1784279A JPS55110770A JP S55110770 A JPS55110770 A JP S55110770A JP 1784279 A JP1784279 A JP 1784279A JP 1784279 A JP1784279 A JP 1784279A JP S55110770 A JPS55110770 A JP S55110770A
Authority
JP
Japan
Prior art keywords
wiping
oxygen concentration
amount
controlled
50000ppm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1784279A
Other languages
English (en)
Other versions
JPS5753429B2 (ja
Inventor
Hajime Hinoto
Kango Sakai
Katsushi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP1784279A priority Critical patent/JPS55110770A/ja
Publication of JPS55110770A publication Critical patent/JPS55110770A/ja
Publication of JPS5753429B2 publication Critical patent/JPS5753429B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/14Removing excess of molten coatings; Controlling or regulating the coating thickness
    • C23C2/16Removing excess of molten coatings; Controlling or regulating the coating thickness using fluids under pressure, e.g. air knives
    • C23C2/18Removing excess of molten coatings from elongated material
    • C23C2/20Strips; Plates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating With Molten Metal (AREA)
JP1784279A 1979-02-20 1979-02-20 Gas wiping method in hot dipping process Granted JPS55110770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1784279A JPS55110770A (en) 1979-02-20 1979-02-20 Gas wiping method in hot dipping process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1784279A JPS55110770A (en) 1979-02-20 1979-02-20 Gas wiping method in hot dipping process

Publications (2)

Publication Number Publication Date
JPS55110770A true JPS55110770A (en) 1980-08-26
JPS5753429B2 JPS5753429B2 (ja) 1982-11-12

Family

ID=11954917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1784279A Granted JPS55110770A (en) 1979-02-20 1979-02-20 Gas wiping method in hot dipping process

Country Status (1)

Country Link
JP (1) JPS55110770A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0397842A (ja) * 1989-09-11 1991-04-23 Sumitomo Metal Ind Ltd 溶融めっき付着量制御方法
WO2010038472A1 (ja) * 2008-10-01 2010-04-08 新日本製鐵株式会社 溶融めっき鋼板の製造方法及び溶融めっき装置
KR101696784B1 (ko) 2016-11-16 2017-01-17 주식회사 삼우에코 고내식 도금용 무산화 씰링장치의 분사노즐
KR101709225B1 (ko) 2016-01-19 2017-02-24 주식회사 삼우에코 고내식 도금용 무산화 용융도금 에어나이프 시스템
KR101709226B1 (ko) 2016-01-19 2017-02-24 주식회사 삼우에코 고내식 도금용 무산화 용융도금장치
KR20240087437A (ko) 2022-12-12 2024-06-19 허기복 고내식 도금용 씰링판 높이조절장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51114334A (en) * 1975-04-01 1976-10-08 Nippon Steel Corp Method of adjusting quantity of adhesion of plated metal in continuous molten metal plating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51114334A (en) * 1975-04-01 1976-10-08 Nippon Steel Corp Method of adjusting quantity of adhesion of plated metal in continuous molten metal plating

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0397842A (ja) * 1989-09-11 1991-04-23 Sumitomo Metal Ind Ltd 溶融めっき付着量制御方法
WO2010038472A1 (ja) * 2008-10-01 2010-04-08 新日本製鐵株式会社 溶融めっき鋼板の製造方法及び溶融めっき装置
JP4988045B2 (ja) * 2008-10-01 2012-08-01 新日本製鐵株式会社 溶融めっき鋼板の製造方法及び溶融めっき装置
KR101324836B1 (ko) * 2008-10-01 2013-11-01 신닛테츠스미킨 카부시키카이샤 용융 도금 강판의 제조 방법 및 용융 도금 장치
AU2009298988B2 (en) * 2008-10-01 2015-07-02 Nippon Steel Corporation Method for producing hot dip plated steel sheet and apparatus for hot dip plating
US9598756B2 (en) 2008-10-01 2017-03-21 Nippon Steel & Sumitomo Metal Corporation Method for producing hot dip plated steel sheet and apparatus for hot dip plating
KR101709225B1 (ko) 2016-01-19 2017-02-24 주식회사 삼우에코 고내식 도금용 무산화 용융도금 에어나이프 시스템
KR101709226B1 (ko) 2016-01-19 2017-02-24 주식회사 삼우에코 고내식 도금용 무산화 용융도금장치
KR101696784B1 (ko) 2016-11-16 2017-01-17 주식회사 삼우에코 고내식 도금용 무산화 씰링장치의 분사노즐
KR20240087437A (ko) 2022-12-12 2024-06-19 허기복 고내식 도금용 씰링판 높이조절장치

Also Published As

Publication number Publication date
JPS5753429B2 (ja) 1982-11-12

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