JPS55111142A - Manufacturing method of lead wire for semiconductor device - Google Patents
Manufacturing method of lead wire for semiconductor deviceInfo
- Publication number
- JPS55111142A JPS55111142A JP1882679A JP1882679A JPS55111142A JP S55111142 A JPS55111142 A JP S55111142A JP 1882679 A JP1882679 A JP 1882679A JP 1882679 A JP1882679 A JP 1882679A JP S55111142 A JPS55111142 A JP S55111142A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- specially treated
- lead wire
- layers
- lead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/202—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern
Landscapes
- Wire Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
PURPOSE: To make reliability of etching and plating processes for lead wire formation higher by a method wherein after the tape is attached to metal foil which has the layers on both surfaces that are treated by electroplating, the inner lead is formed by gold plating followed by removal of electroplated layer of the foil.
CONSTITUTION: The copper alloy foil 1 which has the specially treated layers 4, 4' of both surfaces which are formed by eletroplating such as copper pyrophosphate process etc. is attached to the polyester tape 10 by means of adhesive agent 11 and the pattern of inner lead is formed by photo etching. Continuously the specially treated layers are removed in the bath of ferric chloride solution and unpeeled part 9 of photoresist is taken off with the exception of the part of the specially treated layer 4 covered with adhesive agent layer 11. After this process the lead is completed by apllying gold plate layer 12. Thus because the unremoved parts of photoresist film which is left unremoved at the lead wire pattern etching process and etc. are also removed at the same time by removing the specially treated surface layer that is electroplated and the defectless and highly reliable gold plated layer 12 is achievable.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1882679A JPS55111142A (en) | 1979-02-20 | 1979-02-20 | Manufacturing method of lead wire for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1882679A JPS55111142A (en) | 1979-02-20 | 1979-02-20 | Manufacturing method of lead wire for semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55111142A true JPS55111142A (en) | 1980-08-27 |
Family
ID=11982358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1882679A Pending JPS55111142A (en) | 1979-02-20 | 1979-02-20 | Manufacturing method of lead wire for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55111142A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6365633A (en) * | 1986-09-05 | 1988-03-24 | Hitachi Cable Ltd | Film carrier for semiconductor device |
| JPS63296346A (en) * | 1987-05-28 | 1988-12-02 | Hitachi Cable Ltd | Film carrier for semiconductor device |
| US4975739A (en) * | 1988-10-21 | 1990-12-04 | Nippondenso Co., Ltd. | Electromagnetic relay |
-
1979
- 1979-02-20 JP JP1882679A patent/JPS55111142A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6365633A (en) * | 1986-09-05 | 1988-03-24 | Hitachi Cable Ltd | Film carrier for semiconductor device |
| JPS63296346A (en) * | 1987-05-28 | 1988-12-02 | Hitachi Cable Ltd | Film carrier for semiconductor device |
| US4975739A (en) * | 1988-10-21 | 1990-12-04 | Nippondenso Co., Ltd. | Electromagnetic relay |
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