JPS55154452A - Concentration controlling method of halogen acid salt - Google Patents

Concentration controlling method of halogen acid salt

Info

Publication number
JPS55154452A
JPS55154452A JP6177879A JP6177879A JPS55154452A JP S55154452 A JPS55154452 A JP S55154452A JP 6177879 A JP6177879 A JP 6177879A JP 6177879 A JP6177879 A JP 6177879A JP S55154452 A JPS55154452 A JP S55154452A
Authority
JP
Japan
Prior art keywords
controlled
solution
concentration
halogen acid
acid salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6177879A
Other languages
Japanese (ja)
Other versions
JPS6315547B2 (en
Inventor
Hideo Sugiyama
Satoru Nogami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SEIKO KAKOKI KK
Seikow Chemical Engr and Machinery Ltd
Original Assignee
SEIKO KAKOKI KK
Seikow Chemical Engr and Machinery Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SEIKO KAKOKI KK, Seikow Chemical Engr and Machinery Ltd filed Critical SEIKO KAKOKI KK
Priority to JP6177879A priority Critical patent/JPS55154452A/en
Publication of JPS55154452A publication Critical patent/JPS55154452A/en
Publication of JPS6315547B2 publication Critical patent/JPS6315547B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only

Landscapes

  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Control Of Non-Electrical Variables (AREA)

Abstract

PURPOSE:To control the concentration of halogen acid slat by using the hydrogen peroxide solution which has been controlled of its pH through addition of a buffer as a control reagent. CONSTITUTION:The hydrogen peroxide solution which has been controlled to 6-12 (preferably 8-10) in pH through addition of a buffer (for example, sodium citrate and NaOH) is used. Part of the solution to be controlled (solution of halogenite or hypohalogenite) 1 to be circulated through a filter 2 is fed to a mixing tank 5 through a defoaming tank 4 by a metering pump 3, at the same instant of which the above-mentioned control reagent 6 is fed into the mixing tank 5 by the pump 3 so that both are let to react and the solution to be controlled is treated. On the other hand, if the concentration of the solution to be controlled decreases owing to the above-mentioned treatment, a control circuit 8 is operated by the signal of an oxidation-reduction potential meter 7 to freshly supply the solution 9 to be controlled so as to become the specified controlled concentration.
JP6177879A 1979-05-18 1979-05-18 Concentration controlling method of halogen acid salt Granted JPS55154452A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6177879A JPS55154452A (en) 1979-05-18 1979-05-18 Concentration controlling method of halogen acid salt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6177879A JPS55154452A (en) 1979-05-18 1979-05-18 Concentration controlling method of halogen acid salt

Publications (2)

Publication Number Publication Date
JPS55154452A true JPS55154452A (en) 1980-12-02
JPS6315547B2 JPS6315547B2 (en) 1988-04-05

Family

ID=13180881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6177879A Granted JPS55154452A (en) 1979-05-18 1979-05-18 Concentration controlling method of halogen acid salt

Country Status (1)

Country Link
JP (1) JPS55154452A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390254A3 (en) * 1989-03-25 1991-11-27 Koninklijke Philips Electronics N.V. Method for stabilizing cleaning baths for si wafers, especially for semiconductor devices
EP0681318A1 (en) * 1994-04-28 1995-11-08 Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft Process for treating a semiconducting material with an acid containing liquid
EP2389581A4 (en) * 2009-01-26 2014-10-22 Mi Llc CATIONIC EXCHANGE CAPACITY TITRATION UNIT

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56152862A (en) * 1980-04-28 1981-11-26 Teijin Ltd Flame-retardant resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56152862A (en) * 1980-04-28 1981-11-26 Teijin Ltd Flame-retardant resin composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390254A3 (en) * 1989-03-25 1991-11-27 Koninklijke Philips Electronics N.V. Method for stabilizing cleaning baths for si wafers, especially for semiconductor devices
EP0681318A1 (en) * 1994-04-28 1995-11-08 Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft Process for treating a semiconducting material with an acid containing liquid
EP2389581A4 (en) * 2009-01-26 2014-10-22 Mi Llc CATIONIC EXCHANGE CAPACITY TITRATION UNIT
US9011775B2 (en) 2009-01-26 2015-04-21 M-I L.L.C. Cation exchange capacity titration unit

Also Published As

Publication number Publication date
JPS6315547B2 (en) 1988-04-05

Similar Documents

Publication Publication Date Title
Walmsley Synthesis of a heteropolytungstate and its use in outer-sphere redox kinetics. An inorganic chemistry laboratory experiment
JPS55154452A (en) Concentration controlling method of halogen acid salt
JPS6435551A (en) Bleaching bath concentrate
JP2836838B2 (en) Control method of adding amount of oxidizing agent or reducing agent
DE3479384D1 (en) Pharmaceutical iodophor preparations with controlled iodine:iodide ratio and method of producing the same
JPS5554576A (en) Forming method for phosphate film of steel
JPS563677A (en) Method and apparatus for controlling chemical treating fluid
JPS52100418A (en) Purification of acrylamide aqueous solution
Trofimenko et al. Elimination of the Active Centres of a Pyrographitic Electrode During the Electrodeposition of Copper
DE3163664D1 (en) Process for winning metals from aqueous solutions
JPS5577867A (en) Method of controlling quality of pickles
JPS5423071A (en) Treating method for waste liquid contained hydrazine
JPS53127368A (en) Treating apparatus for washing gas
JPS57182145A (en) Aminoacid fluorometry
JPS5638175A (en) Method and apparatus for removing ammoniacal nitrogen
JPS52118947A (en) Control device for treating activated sludge water
JPS5345667A (en) Treating method for oxidizable substance contained in exhaust gas or discharged liquid
JPS5376027A (en) Regeneration method for photographic bleach fix solution
JPS57188511A (en) Stabilized electrolyte solution
JPS548123A (en) Controller for concentration of plating bath
JPS5534168A (en) Regenerating method of ion exchange material
JPS5322865A (en) Treating method for liquid contained copper ion
JPS5334715A (en) Preparation of amino-polyacetic acid alkali salt
JPS52117286A (en) Treatment of blood contained exhaust liquid by membrane process
SU1685201A1 (en) Method of preparing radioactive solutions for hardening