JPS6315547B2 - - Google Patents
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- Publication number
- JPS6315547B2 JPS6315547B2 JP54061778A JP6177879A JPS6315547B2 JP S6315547 B2 JPS6315547 B2 JP S6315547B2 JP 54061778 A JP54061778 A JP 54061778A JP 6177879 A JP6177879 A JP 6177879A JP S6315547 B2 JPS6315547 B2 JP S6315547B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- solution
- controlled
- control
- orp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
Landscapes
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Control Of Non-Electrical Variables (AREA)
Description
【発明の詳細な説明】
本発明は亜若しくは次亜ハロゲン酸塩の濃度制
御方法に関し、更に詳しくは例えば屎尿、下水処
理場、養鶏、養豚揚、各種工場等において発生す
る各種悪臭成分を含有する悪臭ガスを処理する際
に用いる洗浄用の亜若しくは次亜ハロゲン酸塩溶
液中の該塩の濃度を制御する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for controlling the concentration of subhalite or hypohalite, and more specifically, the present invention relates to a method for controlling the concentration of subhalite or hypohalite, which contains various malodorous components generated in, for example, human waste, sewage treatment plants, poultry farming, pork frying, various factories, etc. The present invention relates to a method for controlling the concentration of a sub- or hypohalite salt solution used for cleaning when treating malodorous gases.
従来斯かる亜若しくは次亜ハロゲン酸塩等の濃
度を制御する方法として例えば近紫外吸光光度法
や電量法が知られている。しかし近紫外吸光光度
法ではもともと装置が高価なうえ、例えば次亜塩
素酸イオン(ClO-)の吸光度がPH及び温度の影
響を受けるため、検出部を高濃度アルカリに保持
しなければならないという欠点がある。従つてこ
の方法では高濃度アルカリ溶液を必要とし、検出
部前の混合槽の取付け、PH管理等の付帯設備等の
面でも不利である。また電量法ではやはり検出電
極に対するPHの影響が著しく検出部のPHを高く保
持する必要がある上に、水の濁り等による検出部
へのスケールの付着或いは液温度による影響が著
しいという欠点がある。 Conventionally, methods for controlling the concentration of such sub- or hypohalite salts include, for example, near-ultraviolet absorption spectrophotometry and coulometric method. However, near-ultraviolet absorption spectrophotometry has the drawback that the equipment is expensive to begin with and, for example, the absorbance of hypochlorite ion (ClO - ) is affected by pH and temperature, so the detection part must be kept in a highly concentrated alkali solution. There is. Therefore, this method requires a highly concentrated alkaline solution, and is disadvantageous in terms of installation of a mixing tank in front of the detection section and ancillary equipment such as pH control. In addition, in the coulometric method, the influence of pH on the detection electrode is significant, and it is necessary to maintain the pH of the detection part at a high level, and there are disadvantages in that scale adhesion to the detection part due to water turbidity, etc., and the influence of liquid temperature are significant. .
そこで本発明者は斯かる従来法の欠点を解決す
るために、被制御溶液に直接酸化還元電位計(以
下酸化還元電位をORPと略記する)を接続して、
該被制御溶液中の亜若しくは次亜ハロゲン酸塩の
濃度を制御する方法(直接ORP制御方法という)
について検討を行つた。しかしながら直接ORP
制御方法では上記ハロゲン酸塩の濃度の変化によ
るORP変化は殆どなく、従つて数mVの電位変
化により制御しなければならず、工業的なレベル
で操作することは不可能であり、よつて任意の濃
度に制御することが困難であつた。 Therefore, in order to solve the drawbacks of the conventional method, the present inventor connected an oxidation-reduction potential meter (hereinafter oxidation-reduction potential is abbreviated as ORP) directly to the controlled solution.
A method of controlling the concentration of sub- or hypohalite in the controlled solution (referred to as direct ORP control method)
We considered the following. However, direct ORP
In the control method, there is almost no change in ORP due to a change in the concentration of the halide salt, and therefore it must be controlled by a change in potential of several mV, which is impossible to operate at an industrial level, and therefore it is not possible to use it arbitrarily. It was difficult to control the concentration to .
本発明者は斯かる問題点に鑑み亜若しくは次亜
ハロゲン酸塩を含む被制御溶液の濃度を制御する
方法につき鋭意研究を継続して行ない、間接
ORP測定方法を利用する濃度制御方法、即ち被
制御溶液の一部を取り出し、これに酸化還元反応
試薬を混合してORPを測定する濃度制御方法に
ついて種々検討を行つた。その結果、斯かる間接
ORP制御方法で使用可能な種々の酸化還元反応
試薬のうち、特にNa2SO3、Na2S2O3、H2O2等が
水酸化物によるスケールの生成や毒性などの問題
点もなく有用であるが、Na2SO3を用いた場合、
該Na2SO3濃度の経時変化が著しく連続制御する
場合の試薬として不適当であり、Na2S2O3も経時
変化は少ないが、液PHにより例えばClO-との反
応比率が異なるため、PHを厳密に一定状態に保つ
必要があり制御用試薬として使用する場合に問題
があることが判り、一方H2O2を用いる場合にも、
H2O2溶液のPHが問題となり、余りPHが高くなる
とH2O2の解離平衡によりHO2 -を生じるため反応
が進行しなくなり、またPHが低いと反応速度が遅
くなり短時間での反応が望めなくなり、且つ被制
御溶液のPHにより当量点変動が著しく、ORP制
御設定点が定まらないため制御困難となることが
判明した。しかしながら更に研究を続けたとこ
ろ、酸化還元反応試薬としてのH2O2溶液に緩衝
剤を添加することにより被制御溶液のPHによる当
量点変動が著しく抑制され、且つ緩衝剤の添加に
より同時にH2O2溶液のPHを特定の範囲に保つこ
とにより制御誤差を著しく少なくできることを見
い出した。本発明は斯かる新規な知見に基づき完
成されたものである。 In view of such problems, the present inventor has continued to conduct intensive research on methods for controlling the concentration of controlled solutions containing sub- or hypohalite salts, and has
We conducted various studies on a concentration control method using the ORP measurement method, that is, a concentration control method in which a part of the solution to be controlled is taken out, a redox reaction reagent is mixed therein, and the ORP is measured. As a result, such indirect
Among the various redox reaction reagents that can be used in the ORP control method, Na 2 SO 3 , Na 2 S 2 O 3 , H 2 O 2, etc., in particular, have no problems such as scale formation or toxicity due to hydroxides. Useful, but with Na 2 SO 3
It is unsuitable as a reagent for continuous control where the Na 2 SO 3 concentration changes significantly over time, and Na 2 S 2 O 3 also shows little change over time, but the reaction ratio with, for example, ClO - differs depending on the liquid pH. It has been found that there is a problem when using it as a control reagent as it is necessary to keep the pH strictly constant.On the other hand, when using H 2 O 2 ,
The pH of the H 2 O 2 solution becomes a problem; if the pH becomes too high, HO 2 - is produced due to the dissociation equilibrium of H 2 O 2 , which prevents the reaction from proceeding, and if the pH is low, the reaction rate slows down and cannot be completed in a short time. It was found that the reaction could no longer be expected, and the equivalence point fluctuated significantly depending on the pH of the solution to be controlled, making control difficult because the ORP control set point could not be determined. However, further research revealed that by adding a buffer to the H 2 O 2 solution as a redox reaction reagent, the equivalence point variation due to the pH of the controlled solution was significantly suppressed, and at the same time, the addition of the buffer also suppressed the change in the equivalence point due to the pH of the controlled solution. We have found that control errors can be significantly reduced by keeping the PH of the O 2 solution within a specific range. The present invention has been completed based on this new knowledge.
即ち本発明は、亜若しくは次亜ハロゲン酸塩の
濃度制御をすべき被制御溶液の一部を取り出し、
これに緩衝剤の添加によりPHを6〜12に調節した
過酸化水素溶液を混合し、該混合液の酸化還元電
位を測定することにより、亜若しくは次亜ハロゲ
ン酸塩の濃度制御を行うことを特徴とする亜若し
くは次亜ハロゲン酸塩の濃度制御方法に係る。 That is, the present invention takes out a part of the solution to be controlled in which the concentration of subhalite or hypohalite is to be controlled,
By mixing this with a hydrogen peroxide solution whose pH has been adjusted to 6 to 12 by adding a buffer, and measuring the redox potential of the mixture, it is possible to control the concentration of sub- or hypohalite salts. The present invention relates to a method for controlling the concentration of a sub- or hypohalite salt.
本発明の濃度制御方法を使用することにより各
種の悪臭成分を含有する有害、悪臭ガスを有効に
且つ洗浄用の被制御溶液の損失を殆ど伴うことな
く除去することのできる、被制御溶液を提供する
ことができる。上記悪臭成分としては例えばアン
モニア、アミン類、低級脂肪酸、硫化水素、メル
カプタン類、チオエーテル類、二硫化アルキル、
アルデヒド類等を例示できる。 To provide a controlled solution that can effectively remove harmful and malodorous gases containing various malodorous components with almost no loss of the controlled solution for cleaning by using the concentration control method of the present invention. can do. Examples of the above-mentioned malodorous components include ammonia, amines, lower fatty acids, hydrogen sulfide, mercaptans, thioethers, alkyl disulfide,
Examples include aldehydes.
本発明で濃度制御の対象となる亜若しくは次亜
ハロゲン酸塩としては例えば亜塩素酸、亜臭素
酸、亜沃素酸等の亜ハロゲン酸のアルカリ金属塩
若しくはアルカリ土類金属塩又は次亜塩素酸、次
亜臭素酸、次亜沃素酸等の次亜ハロゲン酸のアル
カリ金属塩若しくはアルカリ土類金属塩を挙げる
ことができ、就中亜塩素酸ソーダ、次亜塩素酸ソ
ーダ、次亜臭素酸ソーダ等の濃度制御に適用され
る。 Examples of sub- or hypohalite salts whose concentration is to be controlled in the present invention include alkali metal salts or alkaline earth metal salts of halous acids such as chlorous acid, bromic acid, and iodic acid, or hypochlorous acid. , hypobromous acid, hypoiodic acid, and other alkali metal or alkaline earth metal salts of hypohalous acids, among which sodium chlorite, sodium hypochlorite, and sodium hypobromite. Applied to concentration control, etc.
本発明の方法において使用される過酸化水素溶
液は、水溶液が好ましく、緩衝剤を添加すること
によりそのPHを6〜12の範囲に保つことが必要で
ある。更には該PHを6〜10の範囲に保つことによ
り、ORP滴定における滴定誤差を±5%以内と
することができ、より好ましい。また上記PH範囲
を8〜10とする場合には滴定誤差を更に小さくす
ることができ、より一層好ましい。また本発明で
は緩衝剤を加えたH2O2溶液を用いることにより、
被制御溶液のPHに基づく当量点変動の影響を受け
ることが少なく、該変動を100mVの範囲内に抑
えることができ、制御誤差を小さくできる。また
上記過酸化水素溶液として、例えばソーダ石灰、
アスカライト、ピロガロール、塩化カルシウム等
でその開口部をシールした容器中に貯えた過酸化
水素溶液を使用する場合には、経時変化も一層少
なく、被制御溶液のPH変化に対しても殆ど影響を
受けず、酸化還元反応試薬として最も優れたもの
である。 The hydrogen peroxide solution used in the method of the present invention is preferably an aqueous solution, and it is necessary to maintain its pH in the range of 6 to 12 by adding a buffer. Furthermore, by keeping the pH in the range of 6 to 10, the titration error in ORP titration can be kept within ±5%, which is more preferable. Moreover, when the above pH range is set to 8 to 10, the titration error can be further reduced, which is even more preferable. In addition, in the present invention, by using a H 2 O 2 solution containing a buffer,
It is less affected by equivalence point fluctuations based on the pH of the solution to be controlled, and the fluctuations can be suppressed within a range of 100 mV, making it possible to reduce control errors. Further, as the hydrogen peroxide solution, for example, soda lime,
When using a hydrogen peroxide solution stored in a container whose opening is sealed with ascarite, pyrogallol, calcium chloride, etc., there is even less change over time, and there is almost no effect on the pH change of the controlled solution. It is the most excellent redox reaction reagent.
本発明で使用する緩衝剤としては酸化還元反応
試薬であるH2O2及び被制御溶液例えばNaClO溶
液と反応しないもので、弱酸あるいは弱塩基とそ
れらの共役塩基あるいは共役酸との混合水溶液が
広く使用可能であり、例えばホウ砂、ホウ酸、ホ
ウ酸一水素塩等のホウ酸塩、リン酸一水素塩、リ
ン酸二水素塩等のリン酸塩、クエン酸ナトリウム
等のクエン酸塩、或いはこれ等とNaOH、HCl等
との混合物等を使用できる。本発明では斯かる緩
衝剤を使用して6〜12、好ましくは6〜10、より
好ましくは8〜10の範囲のPHを有するH2O2溶液
を調製するのが良く、このためには例えばホウ砂
を用いる場合には酸化還元反応試薬中における濃
度が約0.005〜0.2M/となる範囲が好ましい。 The buffer used in the present invention is one that does not react with H 2 O 2 , which is a redox reaction reagent, and a controlled solution, such as a NaClO solution, and is widely used as a mixed aqueous solution of a weak acid or weak base and its conjugate base or conjugate acid. For example, borax, boric acid, borates such as monohydrogen boric acid, phosphates such as monohydrogen phosphate and dihydrogen phosphate, citrates such as sodium citrate, or A mixture of these and NaOH, HCl, etc. can be used. In the present invention, such buffers may be used to prepare H 2 O 2 solutions having a pH in the range of 6 to 12, preferably 6 to 10, more preferably 8 to 10, and for this purpose, e.g. When using borax, the concentration in the redox reaction reagent is preferably within a range of about 0.005 to 0.2M/.
本発明において被制御溶液である亜若しくは次
亜ハロゲン酸塩溶液中における全塩濃度は、
ORP滴定誤差の見地から約20wt/v%以下が好
ましく、更には約5wt/v%以下がより好まし
い。ここで全塩濃度とは脱臭反応により生ずる
Na2SO4、NaClその他反応生成塩、水中に存在
する塩、次亜塩等に存在する塩などの濃度を意味
するものであり、次亜塩等に含まれる有効塩素濃
度とは無関係のものである。また被制御溶液のPH
はORP変化及び滴定誤差の見地から5〜13、よ
り好ましくは7〜11が望ましいが、更には有害ガ
スを洗浄する場合の含有CO2の問題或いは例えば
NaClOの解離平衡の関係より7.8〜10の範囲が特
に好ましい。 In the present invention, the total salt concentration in the sub- or hypohalite solution which is the controlled solution is:
From the viewpoint of ORP titration error, it is preferably about 20 wt/v% or less, more preferably about 5 wt/v% or less. Here, the total salt concentration is generated by the deodorizing reaction.
It refers to the concentration of Na 2 SO 4 , NaCl and other reaction product salts, salts present in water, salts present in hypochlorite, etc., and is unrelated to the effective chlorine concentration contained in hypochlorite, etc. It is. Also, the pH of the controlled solution
is preferably 5 to 13, more preferably 7 to 11, from the viewpoint of ORP change and titration error, but it is also desirable to have a value of 7 to 11, but it is also possible to solve the problem of CO 2 content when cleaning harmful gases, or for example
The range of 7.8 to 10 is particularly preferable from the relationship of the dissociation equilibrium of NaClO.
本発明の制御方法をより具体的に説明する。 The control method of the present invention will be explained in more detail.
一般に酸化還元当量反応は、式
Nox・Vox=NRed・VRed
[式中、Noxは酸化剤の規定濃度、NRedは還元
剤の規定濃度、Voxは酸化剤の容量、VRedは還
元剤の容量を示す。]
で表わされる。 In general, the redox equivalent reaction is expressed by the formula Nox・Vox=NRed・VRed [In the formula, Nox is the specified concentration of the oxidizing agent, NRed is the specified concentration of the reducing agent, Vox is the capacity of the oxidizing agent, and VRed is the capacity of the reducing agent. . ] It is expressed as .
今、被制御溶液の制御すべき設定濃度をNox
規定、その一部取り出す送液量をVox(ml)とす
る。一方、被制御溶液と混合する前記特定PHの過
酸化水素溶液を上記式の関係を満たす様に濃度を
NRed規定に調整しておく。NRedは任意に定め
得るが、例えばVoxと過酸化水素溶液の送液量
VRedの関係がVox=VRedであれば、Nox=
NRedとなるようにNRed規定濃度を定めれば良
い。 Now, set the set concentration of the controlled solution to be controlled by Nox
The specified amount of liquid to be partially removed is Vox (ml). On the other hand, the concentration of the hydrogen peroxide solution with the specific pH to be mixed with the controlled solution is adjusted to satisfy the relationship of the above formula.
Adjust to NRed regulations. NRed can be determined arbitrarily, but for example, the amount of Vox and hydrogen peroxide solution sent
If the VRed relationship is Vox = VRed, then Nox =
The specified concentration of NRed should be determined so that it becomes NRed.
上記式の関係が成立する反応電位が当量電位で
あり、別途確認して置く。被制御溶液と過酸化水
素溶液との混合液の電位をORP電極により検出
したときに、被制御溶液の濃度が所定の過酸化水
素の濃度よりも濃い場合、例えば上記例でNox
≧NRedの状態では当量電位以上の電位が示さ
れ、この場合には供給液の送液のための制御回路
が作動しないようにしておく。一方、被制御溶液
の濃度が悪臭ガス処理等により消費されて該過酸
化水素の濃度よりも薄くなつた場合、例えば上記
例でNox<NRedの状態では、当量電位未満の電
位が示され、この場合には制御回路が作動し供給
液が被制御溶液内に送液され、被制御溶液の濃度
が増加し、Nox=NRedの状態に復起すると制御
回路を介して送供液の送液が停止する。 The reaction potential at which the relationship of the above formula holds true is the equivalent potential, which is confirmed separately. When the potential of the mixed solution of the controlled solution and the hydrogen peroxide solution is detected by the ORP electrode, if the concentration of the controlled solution is higher than the predetermined concentration of hydrogen peroxide, for example, in the above example, Nox
In a state of ≧NRed, a potential equal to or higher than the equivalent potential is shown, and in this case, the control circuit for feeding the supply liquid is not activated. On the other hand, if the concentration of the controlled solution is consumed due to malodorous gas treatment and becomes thinner than the concentration of hydrogen peroxide, for example in the above example, if Nox < NRed, a potential lower than the equivalent potential is indicated, and this In this case, the control circuit operates and the supply liquid is pumped into the controlled solution, the concentration of the controlled solution increases, and when the state of Nox = NRed returns, the supply liquid is pumped through the control circuit. Stop.
このようにして、被制御溶液の一部を過酸化水
素溶液と混合して酸化還元反応させることによ
り、その反応電位と当量電位の関係から被制御溶
液の濃度を予め定められた設定濃度に制御するも
のである。特に、本発明においては、過酸化水素
溶液のPHを前記特定範囲内に調整していることに
より、制御誤差が著しく少ない。 In this way, by mixing a portion of the controlled solution with the hydrogen peroxide solution and causing a redox reaction, the concentration of the controlled solution is controlled to a predetermined set concentration based on the relationship between the reaction potential and the equivalent potential. It is something to do. In particular, in the present invention, the pH of the hydrogen peroxide solution is adjusted within the specified range, so that control errors are significantly reduced.
本発明の間接ORP制御による亜若しくは次亜
ハロゲン酸塩高濃度溶液即ち供給液の供給方法と
しては、2点設定電位を用いて2点間による
ORP制御の方法、1点制御による方法でかつ制
御信号ONの時点から一定時間タイマーにより供
給する方法、1点制御だけでON、OFF供給する
方法等任意の方法を採用することができる。また
被制御溶液の汚れに対してはフイルターを通過さ
せることにより防ぐことができる。又、イオウ化
合物とNaClOとの反応により生ずるコロイド状
イオウに対してもフイルターの効果は十分であ
り、コロイド状イオウ1000ppmでも十分過が可
能である。 As a method for supplying a high concentration sub- or hypohalite solution, that is, a supply liquid, by indirect ORP control of the present invention, between two points using a two-point set potential,
Any method can be adopted, such as an ORP control method, a one-point control method and a method in which the control signal is supplied using a timer for a certain period of time from the time the control signal is turned ON, or a method in which ON and OFF supplies are performed using only one point control. Further, contamination of the controlled solution can be prevented by passing it through a filter. Furthermore, the filter is sufficiently effective against colloidal sulfur produced by the reaction between sulfur compounds and NaClO, and even 1000 ppm of colloidal sulfur can be sufficiently filtered out.
本発明の制御方法は他の種々の面に応用又は転
用することが可能である。例えば亜塩素酸
(ClO2)を含有する有害ガスをH2O2溶液で洗浄
処理する場合のH2O2溶液の濃度制御に酸化還元
反応試薬としてNaClO溶液を用いて本発明方法
を使用したり、或いは窒素酸化物(NOx)を含
有する有害ガスを亜塩素酸ソーダ(NaClO2)含
有水溶液で洗浄する場、NaClO2の濃度を一定範
囲内に保つため本発明の制御方法を用いたりする
ことができる。 The control method of the present invention can be applied or diverted to various other aspects. For example, when a harmful gas containing chlorite (ClO 2 ) is cleaned with a H 2 O 2 solution, the method of the present invention can be used to control the concentration of the H 2 O 2 solution by using a NaClO solution as a redox reaction reagent. Or, when cleaning harmful gases containing nitrogen oxides (NOx) with an aqueous solution containing sodium chlorite (NaClO 2 ), the control method of the present invention may be used to maintain the concentration of NaClO 2 within a certain range. be able to.
以下に本発明の好ましい実施の態様を第1図に
示したフローシートに従い説明する。 Preferred embodiments of the present invention will be described below according to the flow sheet shown in FIG.
被制御溶液1はフイルター2を通り循環する。
被制御溶液の一部は定量ポンプ3の作動により、
フイルターを通過したのち脱泡槽4で気液分離さ
れ、混合槽5へ送られる。一方、予め定められた
設定濃度の被制御溶液と当量反応する濃度の酸化
還元反応試薬6も定量ポンプにより被制御溶液と
同時に同量が混合槽へ送られ、反応した時の
ORPが検出電極により連続してORPメータ7に
より測定される。この場合、送液量が同量である
のでポンプが一台で済むという利点が得られる。
被制御溶液中の亜若しくは次亜ハロゲン酸塩が悪
臭ガス洗浄装置10に循環することにより消費さ
れ、その濃度が低下し、所定の制御濃度に達する
とORPの大きな変化が生ずる。ORP制御電位を
所定電位に設定しておけば、その電位に達すると
制御回路8が働き、亜若しくは次亜ハロゲン酸塩
高濃度溶液である供給液9が注入され制御濃度を
保つようになつている。 The controlled solution 1 is circulated through a filter 2.
A part of the controlled solution is supplied by the operation of the metering pump 3.
After passing through a filter, it is separated into gas and liquid in a defoaming tank 4 and sent to a mixing tank 5. On the other hand, the same amount of the redox reaction reagent 6, which has a concentration equivalent to the controlled solution having a predetermined concentration, is sent to the mixing tank at the same time as the controlled solution, and when the reaction occurs.
ORP is continuously measured by an ORP meter 7 using a detection electrode. In this case, since the amount of liquid to be fed is the same, there is an advantage that only one pump is required.
As the sub- or hypohalite salt in the controlled solution is circulated through the malodorous gas cleaning device 10, it is consumed and its concentration decreases until a predetermined control concentration is reached, resulting in a large change in ORP. If the ORP control potential is set to a predetermined potential, when that potential is reached, the control circuit 8 is activated, and the supply liquid 9, which is a high concentration solution of sub- or hypohalite salt, is injected to maintain the control concentration. There is.
以下に本発明を実施例を挙げて説明する。 The present invention will be explained below by giving examples.
実施例 1
第1図に記載したフローシートに従つて下記要
領で次亜塩素酸ナトリウムの濃度制御を行つた。Example 1 The concentration of sodium hypochlorite was controlled in the following manner according to the flow sheet shown in FIG.
制御方法:1点設定による間接ORP制御方法
被制御溶液:NaClO、PH=5
酸化還元反応試薬:クエン酸ソーダ0.06M/と
NaOHを添加した0.0226規定H2O2水溶液、PH
=6
上記被制御溶液中のNaClOの制御濃度(有効
塩素)を800ppm、制御ORPを+500mVと設定
する。次いで1M/のNa2SO3水溶液を用いて
該被制御溶液の濃度を変化させながら、制御可能
な上限及び下限濃度を調べたところそれぞれ
890ppm及び820ppmであつた。Control method: Indirect ORP control method with one-point setting Controlled solution: NaClO, PH=5 Redox reaction reagent: Sodium citrate 0.06M/and
0.0226N H2O2 aqueous solution with addition of NaOH , PH
=6 Set the control concentration of NaClO (available chlorine) in the above controlled solution to 800 ppm and control ORP to +500 mV. Next, while changing the concentration of the controlled solution using a 1M Na 2 SO 3 aqueous solution, we investigated the controllable upper and lower limit concentrations.
They were 890ppm and 820ppm.
実施例 2
被制御溶液のPHを8〜10にコントロールし、酸
化還元反応試薬としてホウ砂を0.01M/添加し
たPH=9の0.0282規定H2O2水溶液を用い、制御
濃度1000ppm、制御ORP+400mVに設定し、被
制御溶液の濃度変化を行うためにH2Sを2000〜
21000ppm含有した空気を用いた以外は実施例1
と同様にして実験を行つた。制御可能な上下限濃
度はそれぞれ1070ppm及び980ppmであつた。尚
H2O2水溶液はソーダ石灰でシールしたものを用
いた。Example 2 The PH of the controlled solution was controlled at 8 to 10, and a 0.0282 normal H 2 O 2 aqueous solution with PH = 9 to which 0.01 M of borax was added as a redox reaction reagent was used, and the control concentration was 1000 ppm and the control ORP + 400 mV. Set H2S to 2000 to perform controlled solution concentration changes.
Example 1 except that air containing 21000ppm was used
An experiment was conducted in the same manner. The upper and lower controllable concentration limits were 1070 ppm and 980 ppm, respectively. still
The H 2 O 2 aqueous solution sealed with soda lime was used.
実施例 3
被制御溶液のPHを9にコントロールし、酸化還
元反応試薬としてホウ砂を0.01M/添加したPH
=9の0.197規定H2O2水溶液を用い、制御濃度
7000ppm、制御ORP+400mVに設定し、被制御
溶液の濃度変化を行うためにH2Sを4000〜
18000ppm含有した空気を用いた以外は実施例1
と同様にして実験を行つた。制御可能な上下限濃
度はそれぞれ7100ppm及び7000ppmであつた。尚
H2O2水溶液はソーダ石灰でシールしたものを用
いた。Example 3 The pH of the controlled solution was controlled to 9, and 0.01M/pH of borax was added as a redox reaction reagent.
= 9 using a 0.197 normal H 2 O 2 aqueous solution, control concentration
Set to 7000 ppm, control ORP + 400 mV, and increase H 2 S to 4000 ~ 4000 to change the concentration of the controlled solution.
Example 1 except that air containing 18000 ppm was used
An experiment was conducted in the same manner. The upper and lower controllable concentration limits were 7100ppm and 7000ppm, respectively. still
The H 2 O 2 aqueous solution sealed with soda lime was used.
実施例 4
被制御溶液のPHを12にコントロールし、酸化還
元反応試薬としてクエン酸ソーダ0.06M/と
NaOHを添加したPH=6の0.0226規定H2O2水溶
液を用い、制御濃度800ppm、制御ORP+400m
Vに設定した以外は実施例1と同様にして実験を
行つた。制御可能な上下限濃度はそれぞれ
950ppm及び780ppmであつた。尚H2O2水溶液は
アスカライトでシールしたものを用いた。Example 4 The pH of the controlled solution was controlled at 12, and sodium citrate was added as a redox reaction reagent at 0.06 M/ml.
Using 0.0226 normal H 2 O 2 aqueous solution with PH = 6 added with NaOH, control concentration 800 ppm, control ORP + 400 m
An experiment was conducted in the same manner as in Example 1 except that the voltage was set to V. The upper and lower concentration limits that can be controlled are
They were 950ppm and 780ppm. The H 2 O 2 aqueous solution sealed with ascarite was used.
実施例 5
被制御溶液のPHを12にコントロールし、酸化還
元反応試薬としてホウ砂0.08M/とNaOHを添
加したPH=12の0.0226規定H2O2水溶液を用い、
制御濃度800ppm、制御ORP+200mVに設定し
た以外は実施例1と同様にして実験を行つた。制
御可能な上下限濃度はそれぞれ1010ppm及び
940ppmであつた。尚H2O2水溶液はアスカライト
でシールしたものを用いた。Example 5 The PH of the controlled solution was controlled to 12, and a 0.0226N H 2 O 2 aqueous solution with PH = 12 to which 0.08M borax and NaOH were added as redox reaction reagents was used.
An experiment was conducted in the same manner as in Example 1 except that the control concentration was set to 800 ppm and the control ORP + 200 mV. The upper and lower concentration limits that can be controlled are 1010ppm and 1010ppm, respectively.
It was 940ppm. The H 2 O 2 aqueous solution sealed with ascarite was used.
実施例 6
被制御溶液のPHを13にコントロールし、酸化還
元反応試薬としてホウ砂を0.01M/添加したPH
=9の0.0282規定H2O2水溶液を用い、制御濃度
1000ppm、制御ORP+400mVに設定した以外は
実施例1と同様にして実験を行つた。制御可能な
上下限濃度はそれぞれ1200ppm及び1100ppmであ
つた。Example 6 The pH of the controlled solution was controlled to 13, and 0.01M/pH of borax was added as a redox reaction reagent.
=9 using 0.0282 normal H 2 O 2 aqueous solution, control concentration
An experiment was conducted in the same manner as in Example 1 except that the setting was 1000 ppm and control ORP + 400 mV. The upper and lower controllable concentration limits were 1200 ppm and 1100 ppm, respectively.
実施例 7
被制御溶液のPHを13にコントロールし、酸化還
元反応試薬としてホウ砂を0.08M/添加したPH
=12の0.0282規定H2O2水溶液を用い、制御濃度
1000ppm、制御ORP+200mVに設定した以外は
実施例1と同様にして実験を行つた。制御可能な
上下限濃度はそれぞれ1600ppm及び1500ppmであ
つた。Example 7 The pH of the controlled solution was controlled to 13, and 0.08M/pH of borax was added as a redox reaction reagent.
Using a 0.0282 normal H2O2 aqueous solution of =12, control concentration
An experiment was conducted in the same manner as in Example 1 except that the setting was 1000 ppm and control ORP + 200 mV. The upper and lower controllable concentration limits were 1600 ppm and 1500 ppm, respectively.
参考例 1
本発明における酸化還元反応試薬である過酸化
水素溶液をシール剤でシールしたときのシール効
果を調べた。即ち緩衝剤としてホウ砂0.01M/
を加えたH2O2の貯槽から該H2O2溶液を一定の割
合で連続吸引し、その際該貯槽の吸引開口部をソ
ーダ石灰でシールした場合とシールせず大気開放
した場合のH2O2濃度の減少率を第2図に示す。
該図より連続吸引して5日経過した時点での減少
率は前者(実線)で2%であるのに対し、後者
(点線)では10%であり、シール剤を用いた場合
には用いていない場合に比し5倍もシール効果が
優れていた。Reference Example 1 The sealing effect when a hydrogen peroxide solution, which is a redox reaction reagent in the present invention, was sealed with a sealant was investigated. In other words, borax 0.01M/as a buffering agent
The H 2 O 2 solution is continuously suctioned at a constant rate from a H 2 O 2 storage tank containing H 2 O 2 , and the H Figure 2 shows the rate of decrease in 2 O 2 concentration.
From the figure, the reduction rate after 5 days of continuous suction is 2% in the former (solid line), but 10% in the latter (dotted line), and when a sealant is used, it is not used. The sealing effect was five times better than that without.
第1図は本発明のハロゲン酸塩の制御方法の好
ましい実施態様を示すフローシートである。
第1図において、1は被制御溶液、2はフイル
ター、3は定量ポンプ、4は脱泡槽、5は混合
槽、6は酸化還元反応試薬、7はORPメータ、
8は制御回路、9は供給液、10は悪臭ガス洗浄
装置である。
第2図は、本発明における酸化還元反応試薬を
シール剤でシールしたときのシール効果を示すグ
ラフである。
FIG. 1 is a flow sheet showing a preferred embodiment of the method for controlling halide salts of the present invention. In Figure 1, 1 is a controlled solution, 2 is a filter, 3 is a metering pump, 4 is a defoaming tank, 5 is a mixing tank, 6 is a redox reaction reagent, 7 is an ORP meter,
8 is a control circuit, 9 is a supply liquid, and 10 is a foul-smelling gas cleaning device. FIG. 2 is a graph showing the sealing effect when the redox reaction reagent of the present invention is sealed with a sealant.
Claims (1)
べき被制御溶液の一部を取り出し、これに緩衝剤
の添加によりPHを6〜12に調節した過酸化水素溶
液を混合し、該混合液の酸化還元電位を測定する
ことにより、亜若しくは次亜ハロゲン酸塩の濃度
制御を行うことを特徴とする亜若しくは次亜ハロ
ゲン酸塩の濃度制御方法。 2 上記過酸化水素溶液のPHが6〜10である特許
請求の範囲第1項に記載の濃度制御方法。 3 上記過酸化水素溶液のPHが8〜10である特許
請求の範囲第2項に記載の濃度制御方法。 4 上記過酸化水素溶液として、ソーダ石灰、ア
スカライト、ピロガロール、塩化カルシウム等で
その開口部をシールした容器中に貯えた過酸化水
素溶液を用いることを特徴とする特許請求の範囲
第1〜3項のいずれかに記載の濃度制御方法。[Claims] 1. Take out a part of the solution in which the concentration of subhalite or hypohalite is to be controlled, and mix it with a hydrogen peroxide solution whose pH has been adjusted to 6 to 12 by adding a buffer. A method for controlling the concentration of a sub- or hypohalite salt, characterized in that the concentration of the sub- or hypohalite salt is controlled by measuring the redox potential of the mixed solution. 2. The concentration control method according to claim 1, wherein the hydrogen peroxide solution has a pH of 6 to 10. 3. The concentration control method according to claim 2, wherein the hydrogen peroxide solution has a pH of 8 to 10. 4. Claims 1 to 3, characterized in that the hydrogen peroxide solution used is a hydrogen peroxide solution stored in a container whose opening is sealed with soda lime, ascarite, pyrogallol, calcium chloride, etc. The concentration control method according to any one of paragraphs.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6177879A JPS55154452A (en) | 1979-05-18 | 1979-05-18 | Concentration controlling method of halogen acid salt |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6177879A JPS55154452A (en) | 1979-05-18 | 1979-05-18 | Concentration controlling method of halogen acid salt |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55154452A JPS55154452A (en) | 1980-12-02 |
| JPS6315547B2 true JPS6315547B2 (en) | 1988-04-05 |
Family
ID=13180881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6177879A Granted JPS55154452A (en) | 1979-05-18 | 1979-05-18 | Concentration controlling method of halogen acid salt |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55154452A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3909915A1 (en) * | 1989-03-25 | 1990-09-27 | Philips Nv | METHOD FOR STABILIZING CLEANING BATHS FOR SI DISC, IN PARTICULAR FOR SEMICONDUCTOR COMPONENTS |
| DE4414925A1 (en) * | 1994-04-28 | 1995-11-02 | Wacker Chemitronic | Process for the treatment of semiconductor material with an acidic liquid |
| EA019684B1 (en) | 2009-01-26 | 2014-05-30 | Эм-Ай Эл.Эл.Си. | Cation exchange capacity titration unit |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56152862A (en) * | 1980-04-28 | 1981-11-26 | Teijin Ltd | Flame-retardant resin composition |
-
1979
- 1979-05-18 JP JP6177879A patent/JPS55154452A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55154452A (en) | 1980-12-02 |
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