JPS5528334A - Manufacturing apparatus for ultrafine particle - Google Patents

Manufacturing apparatus for ultrafine particle

Info

Publication number
JPS5528334A
JPS5528334A JP10028978A JP10028978A JPS5528334A JP S5528334 A JPS5528334 A JP S5528334A JP 10028978 A JP10028978 A JP 10028978A JP 10028978 A JP10028978 A JP 10028978A JP S5528334 A JPS5528334 A JP S5528334A
Authority
JP
Japan
Prior art keywords
hole
under
partitioning plate
evaporated
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10028978A
Other languages
Japanese (ja)
Inventor
Atsushi Abe
Kuni Ogawa
Masahiro Nishikawa
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10028978A priority Critical patent/JPS5528334A/en
Publication of JPS5528334A publication Critical patent/JPS5528334A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To coat uniformly the under surface of a substrate arranged in the upper chamber of a vacuum vessel with ultrafine particles evaporated in the under chamber, by dividing the vacuum vessel into two chambers by a partitioning plate, with a hole made in the partitioning plate, and with a shutter attached to the hole. CONSTITUTION:A vacuum vessl constituted of a bottom board 1 and a bell jar 2 is divided into an upper chamber 18 and an under chamber 17 with a partitioning plate 15. A hole 16 is made in the partitioning plate 15 and a shutter 13 is arranged just under the hole 16 in the partitioning plate 15. Substrates 12, 12' are placed in the upper chamber 18, and an evaporating material 7 in the under chamber 17. After the vacuum vessel is evacuated, an inert gas such as Ar, He is introduced. The vaporating material 7 is heated and evaporated by energizing a boat 5 by a power source 6, then the evaporated vapor passes through the hole 16 into the upper chamber 18 and deposits as ultrafine particles on the under surfaces of the substrates 12, 12'. When the deposit of required thickness is formed, the hole 16 is closed by the shutter 13. The evaporated ultrafine particles convects uniformly and symmetrically and forms ultrafine particle films of uniform thickness on the substrates 12, 12'.
JP10028978A 1978-08-16 1978-08-16 Manufacturing apparatus for ultrafine particle Pending JPS5528334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10028978A JPS5528334A (en) 1978-08-16 1978-08-16 Manufacturing apparatus for ultrafine particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10028978A JPS5528334A (en) 1978-08-16 1978-08-16 Manufacturing apparatus for ultrafine particle

Publications (1)

Publication Number Publication Date
JPS5528334A true JPS5528334A (en) 1980-02-28

Family

ID=14270017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10028978A Pending JPS5528334A (en) 1978-08-16 1978-08-16 Manufacturing apparatus for ultrafine particle

Country Status (1)

Country Link
JP (1) JPS5528334A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177366A (en) * 1985-01-31 1986-08-09 Sharp Corp Production of ultrafine particle dispersed substrate
CN101876058A (en) * 2010-03-23 2010-11-03 东莞宏威数码机械有限公司 Vacuum deposition device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50123085A (en) * 1974-03-18 1975-09-27
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50123085A (en) * 1974-03-18 1975-09-27
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177366A (en) * 1985-01-31 1986-08-09 Sharp Corp Production of ultrafine particle dispersed substrate
CN101876058A (en) * 2010-03-23 2010-11-03 东莞宏威数码机械有限公司 Vacuum deposition device

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