JPS5435178A - Ultrafine particle depositing apparatus - Google Patents

Ultrafine particle depositing apparatus

Info

Publication number
JPS5435178A
JPS5435178A JP10131877A JP10131877A JPS5435178A JP S5435178 A JPS5435178 A JP S5435178A JP 10131877 A JP10131877 A JP 10131877A JP 10131877 A JP10131877 A JP 10131877A JP S5435178 A JPS5435178 A JP S5435178A
Authority
JP
Japan
Prior art keywords
ultrafine particle
depositing apparatus
particle depositing
substrate
dividing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10131877A
Other languages
Japanese (ja)
Other versions
JPS5711953B2 (en
Inventor
Fumio Hosomi
Atsushi Abe
Ryoichi Takayama
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10131877A priority Critical patent/JPS5435178A/en
Publication of JPS5435178A publication Critical patent/JPS5435178A/en
Publication of JPS5711953B2 publication Critical patent/JPS5711953B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide an apparatus which makes possible deposition of alloy or high melting material as well, by dividing a vacuum vessel with a dividing plate having a hole into two chambers, and by maintaining a sputtering chamber contg. evaporating source material at a gas press. lower than that of a substrate chamber contg. a substrate.
JP10131877A 1977-08-23 1977-08-23 Ultrafine particle depositing apparatus Granted JPS5435178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10131877A JPS5435178A (en) 1977-08-23 1977-08-23 Ultrafine particle depositing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10131877A JPS5435178A (en) 1977-08-23 1977-08-23 Ultrafine particle depositing apparatus

Publications (2)

Publication Number Publication Date
JPS5435178A true JPS5435178A (en) 1979-03-15
JPS5711953B2 JPS5711953B2 (en) 1982-03-08

Family

ID=14297453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10131877A Granted JPS5435178A (en) 1977-08-23 1977-08-23 Ultrafine particle depositing apparatus

Country Status (1)

Country Link
JP (1) JPS5435178A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2551460A1 (en) * 1983-09-02 1985-03-08 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVE SPRAY DEPOSITION OF METAL COMPOUNDS AND SEMICONDUCTORS
JPS6043481A (en) * 1983-08-19 1985-03-08 旭硝子株式会社 Sputtering method and device
JPS63303068A (en) * 1987-06-03 1988-12-09 Daido Steel Co Ltd Substrate heating device
KR100392811B1 (en) * 2001-08-14 2003-07-28 주식회사 삼원진공 Multiple vacuum depositor of double chamber type
EP1486583A4 (en) * 2002-02-26 2008-03-26 Japan Science & Tech Agency METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR OR INSULATING / METALLIC LAMINAR COMPOSITE BEAM

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5026778A (en) * 1973-03-27 1975-03-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5026778A (en) * 1973-03-27 1975-03-19

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043481A (en) * 1983-08-19 1985-03-08 旭硝子株式会社 Sputtering method and device
FR2551460A1 (en) * 1983-09-02 1985-03-08 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVE SPRAY DEPOSITION OF METAL COMPOUNDS AND SEMICONDUCTORS
JPS63303068A (en) * 1987-06-03 1988-12-09 Daido Steel Co Ltd Substrate heating device
KR100392811B1 (en) * 2001-08-14 2003-07-28 주식회사 삼원진공 Multiple vacuum depositor of double chamber type
EP1486583A4 (en) * 2002-02-26 2008-03-26 Japan Science & Tech Agency METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR OR INSULATING / METALLIC LAMINAR COMPOSITE BEAM
US7638019B2 (en) 2002-02-26 2009-12-29 Japan Science And Technology Agency Method and device for manufacturing semiconductor or insulator-metallic laminar composite cluster

Also Published As

Publication number Publication date
JPS5711953B2 (en) 1982-03-08

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