JPS5533059A - Pressure-reduced reactor - Google Patents

Pressure-reduced reactor

Info

Publication number
JPS5533059A
JPS5533059A JP10539578A JP10539578A JPS5533059A JP S5533059 A JPS5533059 A JP S5533059A JP 10539578 A JP10539578 A JP 10539578A JP 10539578 A JP10539578 A JP 10539578A JP S5533059 A JPS5533059 A JP S5533059A
Authority
JP
Japan
Prior art keywords
pipe
vacuum pump
pump
reactor
compressor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10539578A
Other languages
Japanese (ja)
Inventor
Junichi Nishizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Research Foundation
Original Assignee
Semiconductor Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Research Foundation filed Critical Semiconductor Research Foundation
Priority to JP10539578A priority Critical patent/JPS5533059A/en
Publication of JPS5533059A publication Critical patent/JPS5533059A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To remarkably extend the life of work oil and pump material of a vacuum pump in a pressure-reduced reactor by providing multistage cooling surface refrigerating pump in the intermediate between the reactor and the vacuum pump system. CONSTITUTION:Refrigerant produced in a cycle of a compressor and refrigerating machine is passed through a pipe 11 to cool the cooling surface 6 and through a pipe 12 surrounding the outside of the pipe 11 again to the compressor circularly. Cooling surfaces 7, 8 are connected to the cooling surface 6 via metallic rods 9, 10 of different diameter and length from each other. The temperatures of the surfaces 7, 8 can be controlled by altering the diameter d and length h or quality of material of the rods 9, 10. Thus, water of low liquefying temperature is, for example, almost collected with the surface 8, and most halogenide is evacuated at the surface 7. Accordingly, corrosive gas can be mostly collected at the front stage of the vacuum pump.
JP10539578A 1978-08-28 1978-08-28 Pressure-reduced reactor Pending JPS5533059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10539578A JPS5533059A (en) 1978-08-28 1978-08-28 Pressure-reduced reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10539578A JPS5533059A (en) 1978-08-28 1978-08-28 Pressure-reduced reactor

Publications (1)

Publication Number Publication Date
JPS5533059A true JPS5533059A (en) 1980-03-08

Family

ID=14406439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10539578A Pending JPS5533059A (en) 1978-08-28 1978-08-28 Pressure-reduced reactor

Country Status (1)

Country Link
JP (1) JPS5533059A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475031A (en) * 1987-09-16 1989-03-20 Hitachi Ltd Evacuation apparatus
JPH02245232A (en) * 1988-11-23 1990-10-01 American Teleph & Telegr Co <Att> High-vacuum apparatus
JPH02138424U (en) * 1990-03-02 1990-11-19

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324156A (en) * 1976-08-18 1978-03-06 Mitsubishi Electric Corp Cryogenic cooling device
JPS5370078A (en) * 1976-11-30 1978-06-22 Kernforschung Gmbh Ges Fuer Method and apparatus for separating reverseesublimatable component from gas mixture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324156A (en) * 1976-08-18 1978-03-06 Mitsubishi Electric Corp Cryogenic cooling device
JPS5370078A (en) * 1976-11-30 1978-06-22 Kernforschung Gmbh Ges Fuer Method and apparatus for separating reverseesublimatable component from gas mixture

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475031A (en) * 1987-09-16 1989-03-20 Hitachi Ltd Evacuation apparatus
JPH02245232A (en) * 1988-11-23 1990-10-01 American Teleph & Telegr Co <Att> High-vacuum apparatus
JPH02138424U (en) * 1990-03-02 1990-11-19

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