JPS553620A - Electron ray exposure device - Google Patents

Electron ray exposure device

Info

Publication number
JPS553620A
JPS553620A JP7448078A JP7448078A JPS553620A JP S553620 A JPS553620 A JP S553620A JP 7448078 A JP7448078 A JP 7448078A JP 7448078 A JP7448078 A JP 7448078A JP S553620 A JPS553620 A JP S553620A
Authority
JP
Japan
Prior art keywords
opening
sample
radiated
electron
beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7448078A
Other languages
English (en)
Inventor
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP7448078A priority Critical patent/JPS553620A/ja
Publication of JPS553620A publication Critical patent/JPS553620A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP7448078A 1978-06-20 1978-06-20 Electron ray exposure device Pending JPS553620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7448078A JPS553620A (en) 1978-06-20 1978-06-20 Electron ray exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7448078A JPS553620A (en) 1978-06-20 1978-06-20 Electron ray exposure device

Publications (1)

Publication Number Publication Date
JPS553620A true JPS553620A (en) 1980-01-11

Family

ID=13548468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7448078A Pending JPS553620A (en) 1978-06-20 1978-06-20 Electron ray exposure device

Country Status (1)

Country Link
JP (1) JPS553620A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1526563A1 (en) * 2003-10-20 2005-04-27 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device with aperture
KR100780291B1 (ko) 2006-11-06 2007-11-29 코닉시스템 주식회사 레이저 어닐링 장치

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1526563A1 (en) * 2003-10-20 2005-04-27 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device with aperture
WO2005041242A1 (en) * 2003-10-20 2005-05-06 Ict, Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh Charged particle beam device with aperture
US7763866B2 (en) 2003-10-20 2010-07-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with aperture
EP2498271A3 (en) * 2003-10-20 2012-09-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with aperture
KR100780291B1 (ko) 2006-11-06 2007-11-29 코닉시스템 주식회사 레이저 어닐링 장치

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