JPS574123A - Alignment of aperture with opening for passage of rectangular electron beam - Google Patents

Alignment of aperture with opening for passage of rectangular electron beam

Info

Publication number
JPS574123A
JPS574123A JP7797580A JP7797580A JPS574123A JP S574123 A JPS574123 A JP S574123A JP 7797580 A JP7797580 A JP 7797580A JP 7797580 A JP7797580 A JP 7797580A JP S574123 A JPS574123 A JP S574123A
Authority
JP
Japan
Prior art keywords
aperture
opening
electron beam
length
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7797580A
Other languages
Japanese (ja)
Other versions
JPS5824010B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Teruaki Okino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN filed Critical Jeol Ltd
Priority to JP55077975A priority Critical patent/JPS5824010B2/en
Publication of JPS574123A publication Critical patent/JPS574123A/en
Publication of JPS5824010B2 publication Critical patent/JPS5824010B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To easily perform the alignment of aperture plates by a method wherein the edge length of the opening of the second aperture is formed in twice the length of the opening of the first aperture when an electron beam is projected on an exposed material using the first and the second aperture plates having a rectangular electron beam passing opening respectively and an electron beam deflecting device provided between these apertue plates. CONSTITUTION:The electron beam is projected from an electron gun 1 on the first aperture plate 4 having a rectangular opening 3 by the aid of focussing lens 2 and the electron beam passed through the aperture 3 is deflected by an electrostatic type deflector 5. Then, the electron beam is projected on the second aperture plate 7 having a rectangular opening 6 by an electrostatic lens L and the electron beam passed through the aperture 6 is irradiated at the prescribed location on the exposed material 9 by a projecting lens 8 and a deflector 10. In this constitution, the length of each edge of the opening of the second aperture plate 7 is formed in twice the length of the edge of the opening 3 on the first aperture plate 4. Through these procedures, the aperture plates can be aligned accurately even when the center of rotation of each aperture is not coincided with the center of the opening.
JP55077975A 1980-06-10 1980-06-10 Method for aligning aperture plates with rectangular electron beam passing apertures Expired JPS5824010B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55077975A JPS5824010B2 (en) 1980-06-10 1980-06-10 Method for aligning aperture plates with rectangular electron beam passing apertures

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55077975A JPS5824010B2 (en) 1980-06-10 1980-06-10 Method for aligning aperture plates with rectangular electron beam passing apertures

Publications (2)

Publication Number Publication Date
JPS574123A true JPS574123A (en) 1982-01-09
JPS5824010B2 JPS5824010B2 (en) 1983-05-18

Family

ID=13648890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55077975A Expired JPS5824010B2 (en) 1980-06-10 1980-06-10 Method for aligning aperture plates with rectangular electron beam passing apertures

Country Status (1)

Country Link
JP (1) JPS5824010B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421852A (en) * 1987-07-17 1989-01-25 Fujitsu Ltd Electron beam exposure system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421852A (en) * 1987-07-17 1989-01-25 Fujitsu Ltd Electron beam exposure system

Also Published As

Publication number Publication date
JPS5824010B2 (en) 1983-05-18

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