JPS5539111A - Electron beam axis centering device - Google Patents

Electron beam axis centering device

Info

Publication number
JPS5539111A
JPS5539111A JP11152578A JP11152578A JPS5539111A JP S5539111 A JPS5539111 A JP S5539111A JP 11152578 A JP11152578 A JP 11152578A JP 11152578 A JP11152578 A JP 11152578A JP S5539111 A JPS5539111 A JP S5539111A
Authority
JP
Japan
Prior art keywords
electron beam
vane
axis
center
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11152578A
Other languages
Japanese (ja)
Other versions
JPS5856947B2 (en
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP53111525A priority Critical patent/JPS5856947B2/en
Publication of JPS5539111A publication Critical patent/JPS5539111A/en
Publication of JPS5856947B2 publication Critical patent/JPS5856947B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE: To effectively perform the work of axis centering, by detecting a discrepancy of electron beam axis, with a detection region of the electron beam at near around the center axis further with an electrode vane used constructed in narrower width in a direction toward the center axis.
CONSTITUTION: An electrode vane 11 shows a sector shape with its vertex angle being 90 deg. further with its vertex part cut into an arc shape in the same pattern as an aperture shape of the electron beam device, simultaneously with a center part of the vane 11 being excavated. An inner arc part 11a of each electrode vane 11 is facing each other to form a circular ring shape, with its center gap made coinciding with the device center axis, further with its support made by an outer arc part 11d respectively. The inner arc part 11a makes the action as electron beam detection region.
COPYRIGHT: (C)1980,JPO&Japio
JP53111525A 1978-09-11 1978-09-11 Electron beam alignment device Expired JPS5856947B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53111525A JPS5856947B2 (en) 1978-09-11 1978-09-11 Electron beam alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53111525A JPS5856947B2 (en) 1978-09-11 1978-09-11 Electron beam alignment device

Publications (2)

Publication Number Publication Date
JPS5539111A true JPS5539111A (en) 1980-03-18
JPS5856947B2 JPS5856947B2 (en) 1983-12-17

Family

ID=14563533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53111525A Expired JPS5856947B2 (en) 1978-09-11 1978-09-11 Electron beam alignment device

Country Status (1)

Country Link
JP (1) JPS5856947B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5595326A (en) * 1979-01-11 1980-07-19 Nec Corp Electron beam exposure device
JPS57130352A (en) * 1981-02-05 1982-08-12 Akashi Seisakusho Co Ltd Automatic axis alignment device for charged particle beam
JPS59110966U (en) * 1983-01-17 1984-07-26 富士電気化学株式会社 collective battery
JPH0197353A (en) * 1987-10-08 1989-04-14 Shimadzu Corp Electron beam position adjuster in surface analysis meter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5595326A (en) * 1979-01-11 1980-07-19 Nec Corp Electron beam exposure device
JPS57130352A (en) * 1981-02-05 1982-08-12 Akashi Seisakusho Co Ltd Automatic axis alignment device for charged particle beam
JPS59110966U (en) * 1983-01-17 1984-07-26 富士電気化学株式会社 collective battery
JPH0197353A (en) * 1987-10-08 1989-04-14 Shimadzu Corp Electron beam position adjuster in surface analysis meter

Also Published As

Publication number Publication date
JPS5856947B2 (en) 1983-12-17

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