JPS5541654A - Electron beam deflector - Google Patents

Electron beam deflector

Info

Publication number
JPS5541654A
JPS5541654A JP11462878A JP11462878A JPS5541654A JP S5541654 A JPS5541654 A JP S5541654A JP 11462878 A JP11462878 A JP 11462878A JP 11462878 A JP11462878 A JP 11462878A JP S5541654 A JPS5541654 A JP S5541654A
Authority
JP
Japan
Prior art keywords
magnetic
deflector
field type
magnetic field
deflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11462878A
Other languages
Japanese (ja)
Other versions
JPS5854462B2 (en
Inventor
Katsuhiro Kuroda
Yoshinobu Takeuchi
Akihira Fujinami
Shigeru Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP53114628A priority Critical patent/JPS5854462B2/en
Publication of JPS5541654A publication Critical patent/JPS5541654A/en
Publication of JPS5854462B2 publication Critical patent/JPS5854462B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make the promotion of improvement of the frequency characteristic, without causing an error of positioning, by such means that, near around a magnetic field type deflector, be arranged an electrostatic deflector, with its deflecting plate insulator applied a non-magnetic conductive material, to make both of the deflecting center coinciding.
CONSTITUTION: The constitution comprises an electrostatic deflector, in which a non-magnetic conductive material 22 is applied to surfaces of an insulator 21 plate, and a magnetic field type deflector, consisting of a deflecting coil 23 and a magnetic substance 24 like ferrite, and deflection centers of the both deflectors are made coinciding. In this way, a worsening of magnetic response, caused by an eddy current of the magnetic field type deflector, can be prevented, thus the dynamic characteristic (frequency characteristic) can be improved.
COPYRIGHT: (C)1980,JPO&Japio
JP53114628A 1978-09-20 1978-09-20 electron beam deflector Expired JPS5854462B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53114628A JPS5854462B2 (en) 1978-09-20 1978-09-20 electron beam deflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53114628A JPS5854462B2 (en) 1978-09-20 1978-09-20 electron beam deflector

Publications (2)

Publication Number Publication Date
JPS5541654A true JPS5541654A (en) 1980-03-24
JPS5854462B2 JPS5854462B2 (en) 1983-12-05

Family

ID=14642597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53114628A Expired JPS5854462B2 (en) 1978-09-20 1978-09-20 electron beam deflector

Country Status (1)

Country Link
JP (1) JPS5854462B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585952A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Charged-particle focusing deflecting device
US4774355A (en) * 1986-09-18 1988-09-27 Mitsubishi Petrochemical Co., Ltd. Process for preparing pentaerythritol-tetrakis(3-alkylthio-propionate)
US4779046A (en) * 1985-06-28 1988-10-18 Cameca Electron beam integrated circuit tester
JPH08124505A (en) * 1994-10-27 1996-05-17 Nikon Corp Electromagnetic lens and method of manufacturing the electromagnetic lens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585952A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Charged-particle focusing deflecting device
US4779046A (en) * 1985-06-28 1988-10-18 Cameca Electron beam integrated circuit tester
US4774355A (en) * 1986-09-18 1988-09-27 Mitsubishi Petrochemical Co., Ltd. Process for preparing pentaerythritol-tetrakis(3-alkylthio-propionate)
JPH08124505A (en) * 1994-10-27 1996-05-17 Nikon Corp Electromagnetic lens and method of manufacturing the electromagnetic lens

Also Published As

Publication number Publication date
JPS5854462B2 (en) 1983-12-05

Similar Documents

Publication Publication Date Title
GB1514095A (en) Electron beam apparatus
GB745099A (en) Arrangement for magnetic concentration of an electron beam in a travelling wave tube
GB977270A (en) Improvements in and relating to apparatus for producing magnetic fields
GB1030148A (en) High power electron tube apparatus
JPS5541654A (en) Electron beam deflector
SU581599A1 (en) Band loudspeaker
JPS56116256A (en) Flat cathode ray tube
JPS5535449A (en) Electromagnetic focusing type cathode ray tube
JPS5277573A (en) Magnetic field generating device
JPS54137977A (en) Electron-beam exposure unit
JPS5537715A (en) Cathode ray tube electron gun
JPS52104864A (en) Electron beam deflection device
JPS5228220A (en) Deflection yoke
JPS54134966A (en) Cathode-ray tube electron gun
US3205414A (en) Correction magnets for cathode-ray tubes and methods for magnetizing same
GB1290240A (en)
JPS55115243A (en) Deflector
GB898460A (en) Improvements in and relating to magnetic systems
JPS5749150A (en) Electromagnetic focussing cathode-ray tube
JPS5798965A (en) Flat type cathode ray tube
GB1008860A (en) Improvements in or relating to electron discharge devices
JPS5574213A (en) Microwave ferrite element
JPS5593639A (en) Electromagnetic focussing cathode ray tube
JPS5535518A (en) Magnetic substance pole-face and ferrite magnet pole-face opposing magentic field constitution
JPS5593641A (en) Electromagnetic focussing cathode ray tube