JPS5543844A - Method and apparatus for photoresist sensitizing process - Google Patents

Method and apparatus for photoresist sensitizing process

Info

Publication number
JPS5543844A
JPS5543844A JP11652678A JP11652678A JPS5543844A JP S5543844 A JPS5543844 A JP S5543844A JP 11652678 A JP11652678 A JP 11652678A JP 11652678 A JP11652678 A JP 11652678A JP S5543844 A JPS5543844 A JP S5543844A
Authority
JP
Japan
Prior art keywords
photoresist
wafer
unsensitized
photomask
enclose
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11652678A
Other languages
Japanese (ja)
Inventor
Kazutaka Narita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11652678A priority Critical patent/JPS5543844A/en
Publication of JPS5543844A publication Critical patent/JPS5543844A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To improve a precision of photoresist process by providing a precise thermostat on a portion where to mount photomask and wafer and also on a portion where to enclose unsensitized wafer.
CONSTITUTION: There is provided a precise thermostat in an area A including a stage part 4 to mount a wafer for photoresist sensitizing process and a photomask 5 holding part and also in an area B to enclose a multitude of unsensitized wafers at a stage preceding to photoresist sensitizing process, and temperatures on those portions and room temperature are adjusted to coincide with a set temperature. A photoresist error to occur according to thermal expansion is minimized consequently to improve a pattern precision by photoresist process.
COPYRIGHT: (C)1980,JPO&Japio
JP11652678A 1978-09-25 1978-09-25 Method and apparatus for photoresist sensitizing process Pending JPS5543844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11652678A JPS5543844A (en) 1978-09-25 1978-09-25 Method and apparatus for photoresist sensitizing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11652678A JPS5543844A (en) 1978-09-25 1978-09-25 Method and apparatus for photoresist sensitizing process

Publications (1)

Publication Number Publication Date
JPS5543844A true JPS5543844A (en) 1980-03-27

Family

ID=14689304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11652678A Pending JPS5543844A (en) 1978-09-25 1978-09-25 Method and apparatus for photoresist sensitizing process

Country Status (1)

Country Link
JP (1) JPS5543844A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753933A (en) * 1980-09-18 1982-03-31 Toshiba Corp Manufacture of semiconductor element
JPS5776851A (en) * 1980-10-31 1982-05-14 Watanabe Shoko:Kk Inspecting device for photoelectric element
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS57164739U (en) * 1981-04-13 1982-10-18
JPS5815232A (en) * 1981-07-20 1983-01-28 Toshiba Corp Apparatus for exposing charged particle beam
JPS59200241A (en) * 1983-04-28 1984-11-13 Hoya Corp Contact printer
JPS60158626A (en) * 1984-01-30 1985-08-20 Canon Inc semiconductor exposure equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958770A (en) * 1972-10-04 1974-06-07
JPS5225576A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Exposure method of photo-resist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958770A (en) * 1972-10-04 1974-06-07
JPS5225576A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Exposure method of photo-resist

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753933A (en) * 1980-09-18 1982-03-31 Toshiba Corp Manufacture of semiconductor element
JPS5776851A (en) * 1980-10-31 1982-05-14 Watanabe Shoko:Kk Inspecting device for photoelectric element
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS57164739U (en) * 1981-04-13 1982-10-18
JPS5815232A (en) * 1981-07-20 1983-01-28 Toshiba Corp Apparatus for exposing charged particle beam
JPS59200241A (en) * 1983-04-28 1984-11-13 Hoya Corp Contact printer
JPS60158626A (en) * 1984-01-30 1985-08-20 Canon Inc semiconductor exposure equipment

Similar Documents

Publication Publication Date Title
JPS56135969A (en) Manufacture of semiconductor device
JPS60158626A (en) semiconductor exposure equipment
EP0357425A3 (en) An exposure apparatus
EP0359497A3 (en) An exposure method
JPS5543844A (en) Method and apparatus for photoresist sensitizing process
JPS55123131A (en) Exposer for mask alignment
JPS54149586A (en) Mask aligner
JPS5532022A (en) Correcting method of elongation or contraction quantity of wafer
JPS57149731A (en) Exposing device
JPS5494881A (en) Exposure method
JPS5633827A (en) Photo etching method including surface treatment of substrate
JPS5240059A (en) Process for production of semiconductor device
JPS5651732A (en) Exposure processing method
JPS54158445A (en) Sintering of photosensitive resin
JPS52139363A (en) Heat treatment method for wafers
JPS5726170A (en) Formation of al or al alloy pattern
JPS5489576A (en) Gas phase growth method
JPS54136174A (en) Automatic semiconductor thermal processor
JPS56132343A (en) Mask for x-ray exposure and its manufacture
JPS551130A (en) Furnace core pipe for manufacturing semiconductor
JPS57148351A (en) Laser annealing apparatus for semiconductor element
JPS558013A (en) Semiconductor device manufacturing method
JPS5359370A (en) Positioning method
EP0363163A3 (en) X-ray exposure apparatus
JPS5487074A (en) Manufacture of semiconductor device