JPS5550465A - Electon beam vapor deposition method - Google Patents

Electon beam vapor deposition method

Info

Publication number
JPS5550465A
JPS5550465A JP12301278A JP12301278A JPS5550465A JP S5550465 A JPS5550465 A JP S5550465A JP 12301278 A JP12301278 A JP 12301278A JP 12301278 A JP12301278 A JP 12301278A JP S5550465 A JPS5550465 A JP S5550465A
Authority
JP
Japan
Prior art keywords
liner
evaporation
wire
shock
evaporation material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12301278A
Other languages
Japanese (ja)
Other versions
JPS5814876B2 (en
Inventor
Kikuo Koga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP12301278A priority Critical patent/JPS5814876B2/en
Publication of JPS5550465A publication Critical patent/JPS5550465A/en
Publication of JPS5814876B2 publication Critical patent/JPS5814876B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form exceedingly stabilized small ball as evaporation source on the surface of liner, by heating and melting the liner surface and tip end part of evaporation material drawn out on the surface by electron shock. CONSTITUTION:The needle-shaped wire 10 is taken out nearly the surface of the liner 9 and shock is given to the surface of the liner 9 and the wire 10 by the electron beam 6 generated from the electron gun 5 and evaporation of tip part of the wire 10 is begun to evaporate melting by heating. On this occasion, when sending speed of the wire 10 is slightly accelerated in a condition keeping the power of the beam 6 projected on the liner 9 constant, quantity of molten evaporation material is increased and the small ball 15 is formed by the evaporation material on the surface of the liner 9 by surface tension as shown in the figure. Then, highest temperature is revealed at the surface of the ball 15 because shock is given by the beam 6 directly and evaporation material is vapor deposited on the material to be vapor deposited by vigorous evaporation.
JP12301278A 1978-10-05 1978-10-05 Electron beam evaporation method Expired JPS5814876B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12301278A JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12301278A JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Publications (2)

Publication Number Publication Date
JPS5550465A true JPS5550465A (en) 1980-04-12
JPS5814876B2 JPS5814876B2 (en) 1983-03-22

Family

ID=14850048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12301278A Expired JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Country Status (1)

Country Link
JP (1) JPS5814876B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57171450A (en) * 1981-04-10 1982-10-22 Kyokuto Kaihatsu Kogyo Co Monitor device for crushing treatment of crusher

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57171450A (en) * 1981-04-10 1982-10-22 Kyokuto Kaihatsu Kogyo Co Monitor device for crushing treatment of crusher

Also Published As

Publication number Publication date
JPS5814876B2 (en) 1983-03-22

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