JPS5558405A - Electron beam type observation apparatus - Google Patents
Electron beam type observation apparatusInfo
- Publication number
- JPS5558405A JPS5558405A JP13055278A JP13055278A JPS5558405A JP S5558405 A JPS5558405 A JP S5558405A JP 13055278 A JP13055278 A JP 13055278A JP 13055278 A JP13055278 A JP 13055278A JP S5558405 A JPS5558405 A JP S5558405A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- mark
- specimen
- station
- calibrating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 7
- 238000006073 displacement reaction Methods 0.000 abstract 1
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE: To provide an electron beam type observing apparatus which can dispose an electron beam always on a position calibrated by a standard mark to precisely detect the position by utilizing high resolution of a scanning electron microscope.
CONSTITUTION: An electron beam is dispoded at a position 1a when measuring a specimen and at another position 1b when calibrating the position of the electron beam. A mark plate 2 for calibrating the position of the electron beam has a mark 3 for detecting the position, and is supported by a supporting station 5. A fine position control mechanism is provided among the station 5, a base and the mark plate 2. A specimen 4 to be measured is disposed on a table 6, and biaxially moved in X and Y directions to be observed. Mirrors 7, 8 are disposed on the station 5 and the table 4, respectively to determine the position of the specimen by a light wave interferometer. Then, electron beams 1a, 1b are independently biaxially deflected in X and Y directions within predetermined ranges to thereby detect a standard position detecting mark 3 so as to thus calibrate the displacements of the position.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13055278A JPS5558405A (en) | 1978-10-25 | 1978-10-25 | Electron beam type observation apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13055278A JPS5558405A (en) | 1978-10-25 | 1978-10-25 | Electron beam type observation apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5558405A true JPS5558405A (en) | 1980-05-01 |
Family
ID=15036993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13055278A Pending JPS5558405A (en) | 1978-10-25 | 1978-10-25 | Electron beam type observation apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5558405A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009302014A (en) * | 2008-06-17 | 2009-12-24 | Hitachi High-Technologies Corp | Electron microscope, observing test-piece, test-piece base of electron microscope, and semiconductor wafer |
| JP2020129534A (en) * | 2019-01-21 | 2020-08-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Apparatus and method for determining the position of an element on a photolithographic mask |
-
1978
- 1978-10-25 JP JP13055278A patent/JPS5558405A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009302014A (en) * | 2008-06-17 | 2009-12-24 | Hitachi High-Technologies Corp | Electron microscope, observing test-piece, test-piece base of electron microscope, and semiconductor wafer |
| JP2020129534A (en) * | 2019-01-21 | 2020-08-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Apparatus and method for determining the position of an element on a photolithographic mask |
| US11385540B2 (en) | 2019-01-21 | 2022-07-12 | Carl Zeiss Smt Gmbh | Apparatus and method for determining a position of an element on a photolithographic mask |
| US11650495B2 (en) | 2019-01-21 | 2023-05-16 | Carl Zeiss Smt Gmbh | Apparatus and method for determining a position of an element on a photolithographic mask |
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